图 片 |
设备名称 |
制造商 |
型号 |
年份 |
详细配置 |
状 态 |
|
SUPERCRITICAL RINSER&DRYER |
Rexxam |
SCRD6 |
2008 |
WET |
国外
|
|
Rudolph S200ETCH |
Rudolph |
S200ETCH |
2000 |
METROLOGY |
国外
|
|
SCREEN AS2000 |
SCREEN |
AS2000 |
1998 |
WET |
国外
|
|
SCREEN AS2000 |
SCREEN |
AS2000 |
1998 |
WET |
国外
|
|
SCREEN AS2000 |
SCREEN |
AS2000 |
2000 |
WET |
国外
|
|
RTA |
SCREEN |
LA-830 |
- |
RTP |
国外
|
|
SCREEN SK-80BW-AVQ |
SCREEN |
SK-80BW-AVQ |
1998 |
PHOTOLITHO |
国外
|
|
WAFER SCRUBBER |
SCREEN |
SS-W80A-AR |
1995 |
WET |
国外
|
|
WAFER SCRUBBER |
SCREEN |
SS-W80A-AR |
2000 |
WET |
国外
|
|
WAFER SCRUBBER |
SCREEN |
SS-W80A-AVR |
1998 |
WET |
国外
|
|
WAFER SCRUBBER |
SCREEN |
SS-W80A-AVR |
2002 |
WET |
国外
|
|
FILM THICKNESS MEASUREMENT |
SOPRA |
GESP5 |
2010 |
METROLOGY |
国外
|
|
MO CVD |
TAIYO NIPPON SANSO |
SR64212HKS |
2010 |
CVD |
国外
|
|
AUTOMATIC VISUAL INSPECTION |
TAKANO (TOPCON) |
Vi-4202 |
2004 |
METROLOGY |
国外
|
|
TAKANO WM-5000 |
TAKANO(TOPCON) |
WM-5000 |
2005 |
METROLOGY |
国外
|
|
TAKATORI AMR-2200G |
TAKATORI |
AMR-2200G |
- |
BACK GRIND |
国外
|
|
TEL ACT8(2C2D)涂胶显影机 |
TEL |
ACT8 |
1998 |
PHOTOLITHO |
国外
|
|
TEL Alpha-8SE DIFFUSION |
TEL |
Alpha-8SE |
2005 |
DIFFUSION |
国外
|
|
TEL IW-6C FURNACE_LP-CVD |
TEL |
IW-6C |
1994 |
FURNACE |
国外
|
|
TEL MARK7涂胶显影机 |
TEL |
MARK7 |
1993 |
WET |
国外
|
|
TEL MARK8涂胶显影机 |
TEL |
MARK8 |
1999 |
PHOTOLITHO |
国外
|
|
TEL MARK-V涂胶显影机 |
TEL |
MARK-V |
1992 |
PHOTOLITHO |
国外
|
|
TEL MARK-VZ涂胶显影机 |
TEL |
MARK-VZ |
1998 |
PHOTOLITHO |
国外
|
|
TEL P-12XL |
TEL |
P-12XL |
2002 |
TEST |
国外
|
|
TEL P-12XL |
TEL |
P-12XL |
2002 |
TEST |
国外
|
|
TEL P-12XLn |
TEL |
P-12XLn |
2006 |
TEST |
国外
|
|
TEL P-8XL |
TEL |
P-8XL |
2000 |
TEST |
国外
|
|
TEL P-8XL |
TEL |
P-8XL |
2004 |
TEST |
国外
|
|
TEL P-8XL |
TEL |
P-8XL |
2008 |
TEST |
国外
|
|
TEL SS-4 |
TEL |
SS-4 |
2001 |
WET |
国外
|
|
TEL SS-4 |
TEL |
SS-4 |
2003 |
WET |
国外
|
|
TEL TACTRAS |
TEL |
TACTRAS |
2013 |
ETCH |
国外
|
|
TEL TE5000ATC |
TEL |
TE5000ATC |
1992 |
ETCH |
国外
|
|
TEL TE8500(S) |
TEL |
TE8500(S) |
2000 |
ETCH |
国外
|
|
TEL TE8500(S)ATC |
TEL |
TE8500(S)ATC |
1992 |
ETCH |
国外
|
|
TEL TE8500(S)ATC |
TEL |
TE8500(S)ATC |
1993 |
ETCH |
国外
|
|
TEL TE8500(S)ATC |
TEL |
TE8500(S)ATC |
1995 |
ETCH |
国外
|
|
TEL TE8500ATC |
TEL |
TE8500ATC |
1995 |
ETCH |
国外
|
|
TEL Telius SCCM |
TEL |
Telius SCCM |
2000 |
ETCH |
国外
|
|
TEL Unity Me 85D |
TEL |
Unity Me 85D |
2003 |
ETCH |
国外
|
|
TEL UnityII-855II |
TEL |
UnityII-855II |
1996 |
ETCH |
国外
|
|
TEL UnityII-855II |
TEL |
UnityII-855II |
1996 |
ETCH |
国外
|
|
TEL UnityIIe-655II |
TEL |
UnityIIe-655II |
2002 |
ETCH |
国外
|
|
TEL UnityII-855II |
TEL |
UnityIIe-855II |
1997 |
ETCH |
国外
|
|
TEL UnityII-855II |
TEL |
UnityIIe-855II |
2002 |
ETCH |
国外
|
|
TEL UnityIIe-855SS |
TEL |
UnityIIe-855SS |
2000 |
ETCH |
国外
|
|
TEL UnityIIe-855SS |
TEL |
UnityIIe-855SS |
2006 |
ETCH |
国外
|
|
ASHER |
TOK |
TCA-3822 |
1995 |
ASHER |
国外
|
|
ASHER |
TOK |
TCA-3822 |
1995 |
ASHER |
国外
|
|
OXIDE ETCHER |
TOK |
TCE-3822 |
- |
ETCH |
国外
|
|
OXIDE ETCHER |
TOK |
TCE-3822 |
- |
ETCH |
国外
|
|
AUTOMATIC VISUAL INSPECTION |
TORAY |
INSPECTRA-3000TR200M |
2015 |
METROLOGY |
国外
|
|
ULTRATECH Saturn-SS3 |
ULTRATECH |
Saturn-SS3 |
2001 |
PHOTOLITHO |
国外
|
|
ULVAC EI-7L蒸发台 |
ULVAC爱发科 |
EI-7L |
- |
PVD |
国外
|
|
USHIO PE-250R2HK |
USHIO |
PE-250R2HK |
- |
PHOTOLITHO |
国外
|
|
USHIO PE-250T2HM |
USHIO |
PE-250T2HM |
- |
PHOTOLITHO |
国外
|
|
USHIO UMA-1002-HC933HD激光扫描仪 |
USHIO |
UMA-1002-HC933HD |
1998 |
PHOTOLITHO |
国外
|
|
LDI设备 3波长(wavelength)/6HEAD |
SCREEN |
- |
2019 |
Photo Solder |
国外
|
|
LDI设备 405波长 (wavelength) |
ADTECH |
- |
2016 |
Resist |
国外
|
|
LDI设备 3波长(wavelength)/5HEAD |
SCREEN |
- |
2018 |
DF |
国外
|
|
LDI设备 多波长(multi wavelength) |
overtech |
- |
2014 |
PSR/DF |
国外
|
|
真空层圧设备 |
LEETEK |
- |
2014 |
DF |
国外
|
|
自动露光机/平行光 |
Hakuto |
- |
2009 |
DF |
国外
|
|
自动露光机/平行光 |
Hakuto |
- |
2007 |
DF |
国外
|
|
自动露光机/平行光 |
ORC |
- |
2004 |
DF |
国外
|
|
HITACHI DF层压设备 |
HITACHI |
DF层压设备 |
- |
PSR/DF |
国外
|
|
PSR全自动印刷机 |
SERIA |
- |
2005 |
DF |
国外
|
|
PSR悬挂干燥机 |
BMI |
- |
2005 |
PSR |
国外
|
|
PSR半自动4轴机 |
SERIA |
- |
2016 |
PSR |
国外
|
|
PSR半自动4轴机 |
SDK' |
- |
2018 |
PSR MARKING |
国外
|
|
PSR半自动4轴机 |
SDK' |
- |
2017 |
PSR MARKING |
国外
|
|
PSR半自动4轴机 |
minongmt |
- |
2010 |
PSR MARKING |
国外
|
|
PSR隧道式预干燥机 |
SMUV |
- |
2020 |
PSR MARKING |
国外
|
|
PSR预处理喷射线 |
SIE |
- |
2007 |
PSR |
国外
|
|
PSR现像机 |
Taesung |
- |
2009 |
PSR |
国外
|
|
PSR最终干燥机 |
Taeyang |
- |
1999 |
PSR |
国外
|
|
PSR UV干燥机 |
SMUV |
- |
2020 |
PSR |
国外
|
|
箱式干燥机 |
SMUV |
- |
2020 |
PSR |
国外
|
|
自动搬送Conveyor |
Hansong |
- |
2018 |
PSR |
国外
|
|
DES(Development Etching Strip )Line |
- |
- |
- |
AUTOMATION |
国外
|
|
2 Chamber)/Flexible or Rigid 対応 |
Camellia |
- |
2014 |
PATTEN |
国外
|
|
DES(Development Etching Strip )Line |
- |
- |
- |
PATTEN |
国外
|
|
2 Chamber)/Rigid 対応 |
Camellia |
- |
2007 |
PATTEN |
国外
|
|
DES(Development Etching Strip )Line |
- |
- |
- |
PATTEN |
国外
|
|
4 Chamber)/Flexible or Rigid 対応 |
NTP |
- |
2011 |
PATTEN |
国外
|
|
DES(Development Etching Strip )Line |
- |
- |
- |
PATTEN |
国外
|
|
4 Chamber)/Rigid 対応 |
SMC |
- |
2007 |
LAYER |
国外
|
|
Half Etching(电镀后) |
Taesung |
- |
2011 |
LAYER |
国外
|
|
氧化物(Sheet RTR兼用) |
DUC |
- |
2017 |
LAYER |
国外
|
|
外形加工(切断) |
Daliang |
- |
2013 |
LAYER |
国外
|
|
2 轴 X-RAY Drill Machine |
Hansong |
- |
2013 |
LAYER |
国外
|
|
2 轴 X-RAY Drill Machine |
Hansong |
- |
2012 |
LAYER |
国外
|
|
SUS 前处理装置 |
Taesung |
- |
2012 |
LAYER |
国外
|
|
自动真空成形装置(6段) |
Fusei |
- |
1999 |
LAYER |
国外
|
|
自动真空成形装置(6段) |
Fusei |
- |
2006 |
LAYER |
国外
|
|
冷压液压机(6段) |
Fusei |
- |
1999 |
COATING |
国外
|
|
圧力机 |
Fusei |
- |
1999 |
COATING |
国外
|
|
Brown Oxide |
Keystone |
- |
2011 |
COATING |
国外
|
|
2次Lay up设备 |
ESSENTEK |
- |
2005 |
COATING |
国外
|
|
VF电镀装置/15,000张 |
TKC |
- |
2009 |
COATING |
国外
|
|
VF电镀装置/15,000张 |
TKC |
- |
2011 |
COATING |
国外
|
|
4轴前处理机 |
Taesung |
- |
2009 |
COATING |
国外
|
|
2轴去毛刺设备 |
Taesung |
- |
2012 |
HARF MACHINE |
国外
|
|
水平去污设备 |
Keystone |
- |
- |
HARF MACHINE |
国外
|
|
Black Hole Machine |
Keystone |
- |
- |
SPS |
国外
|
|
Shield Press Machine |
DINGA |
- |
2012 |
RELIABILITY |
国外
|
|
Shield Press Machine |
VISION KOREA |
- |
2016 |
RELIABILITY |
国外
|
|
PCB BONDING Machine |
Hansong |
- |
2003 |
RELIABILITY |
国外
|
|
3次元测定器 |
MicroVu |
- |
2018 |
- |
国外
|
|
2010/2009 |
- |
- |
- |
- |
国外
|
|
3次元测定器 |
MicroVu |
- |
2005 |
- |
国外
|
|
电镀测厚仪 |
SEIKO |
- |
2012 |
- |
国外
|
|
Plasma Therm Versaline ICP-RIE #2 PSS IC |
Plasma |
Therm Versaline ICP-RIE #2 PSS |
- |
As-is |
国外
|
|
AMSL XT760F KrF Scanner |
AMSL |
XT760F KrF Scanner |
- |
As-is |
国外
|
|
EBARA EPO 222 CMP |
EBARA |
EPO-222 CMP |
- |
As-is |
国外
|
|
Oxford Plasmalab System 100 RIE+PECVD |
OXFORD牛津 |
Plasmalab System 100 RIE+PECVD |
- |
As-is |
国外
|
|
DNS SU3200 |
DNS |
SU3200 |
- |
As-is |
国外
|
|
LAM RAINBOW 4420等离子刻蚀机 |
LAM泛林 |
RAINBOW 4420 |
- |
6" As-is |
国外
|
|
KLA Tencor 2552缺陷数据分析处理仪 |
KLA科磊 |
2552 |
- |
As-is |
国外
|
|
USHIO UX-4440 Aligner |
USHIO |
UX-4440 Aligner |
- |
As-is |
国外
|
|
CHA Revolution |
CHA |
Revolution |
- |
As-is |
国外
|
|
ULVAC EX W300多腔溅射设备 |
ULVAC爱发科 |
EX W300 |
- |
As-is Multi-ch(8ch)Sputtering |
国外
|
|
ULVAC EI-7K蒸发台 |
ULVAC爱发科 |
EI-7K |
- |
As-is |
国外
|
|
ULVAC EI-5K蒸发台 |
ULVAC爱发科 |
EI-5K |
- |
As-is |
国外
|
|
ULVAC Chamber(5CH) |
ULVAC爱发科 |
Chamber(5CH) |
- |
12" As-is |
国外
|
|
EBARA F-REX300S CMP |
EBARA |
F-REX300S CMP |
- |
12" FULL REPUB |
国外
|
|
Maxis 300LA ICP |
Maxis |
300LA ICP |
- |
12" As-is |
国外
|
|
Nippon Sanso |
Nippon |
Sanso |
- |
6" As-is |
国外
|
|
Aixtron Crius II MOCVD设备 |
Aixtron |
Crius II |
- |
As-is |
国外
|
|
DISCO DFD641划片机 |
DISCO |
DFD641 |
- |
8"Working |
国外
|
|
Oxford Plasma Pro NGP1000 |
OXFORD牛津 |
Plasma Pro NGP1000 |
- |
12" As-is |
国外
|
|
AMAT Centura DPS+ Poly Etch |
AMAT应用材料 |
Centura DPS+ Poly Etch |
- |
As-is |
国外
|
|
AMAT Producer-GT CVD |
AMAT应用材料 |
Producer-GT CVD |
- |
As-is |
国外
|
|
AMAT mirra MESA CMP |
AMAT应用材料 |
mirra MESA CMP |
- |
FULL REPUB |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
- |
8" REFURB |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
- |
FULL REPUB |
国外
|
|
HITACHI HL7800M |
HITACHI |
HL7800M |
- |
As-is |
国外
|
|
HITACHI HL8000M |
HITACHI |
HL8000M |
- |
As-is |
国外
|
|
HITACHI S-4800扫描电子显微镜 |
HITACHI |
S4800 |
- |
working |
国外
|
|
HITACHI FESEM S4700 II扫描电子显微镜 |
HITACHI |
FESEM S4700 II |
- |
FULL REPUB |
国外
|
|
HITACHI FESEM S4700 II扫描电子显微镜 |
HITACHI |
FESEM S4700 II |
- |
Working |
国外
|
|
HITACHI S-9260A扫描电子显微镜 |
HITACHI |
S-9260A |
- |
8" FULL REPUB CDSEM |
国外
|
|
TEL P-12XL Probe |
TEL |
P-12XL Probe |
- |
12" As-is |
国外
|
|
TEL MARK-VZ涂胶显影机 |
TEL |
MARK-VZ |
- |
As-is 2C2D |
国外
|
|
TEL ACT8 2C4D, Double Block |
TEL |
ACT8 2C4D, Double Block |
- |
working |
国外
|
|
TEL MARK8涂胶显影机 |
TEL |
MARK8 |
- |
working track (2c1d) |
国外
|
|
TEL MARK7涂胶显影机 |
TEL |
MARK7 |
- |
200 As-is Single Block |
国外
|
|
TEL MARK8涂胶显影机 |
TEL |
MARK8 |
- |
200 As-is Single Block |
国外
|
|
TEL ACT12 Single Block |
TEL |
ACT12 Single Block |
- |
300 As-is |
国外
|
|
TEL ACT8 Single Block |
TEL |
ACT8 Single Block |
- |
200 As-is |
国外
|
|
CANON FPA-3000i4步进式光刻机 |
CANON |
FPA-3000i4 |
- |
Working |
国外
|
|
NIKON NSR S205C光刻机 |
NIKON |
NSR-S205C |
- |
As-is |
国外
|
|
NIKON NSR SF200光刻机 |
NIKON |
NSR-SF200 |
2003 |
Working |
国外
|
|
NIKON NSR 207D光刻机 |
NIKON |
NSR-207D |
- |
working |
国外
|
|
NIKON NSR 2205i12D光刻机 |
NIKON |
NSR-2205i12D |
- |
Initial Condition |
国外
|
|
NIKON NSR 2005i9C步进式光刻机 |
NIKON |
NSR-2005i9C |
- |
Working |
国外
|
|
NIKON NSR 2205 EX12B光刻机 |
NIKON |
NSR-2205EX12B |
- |
As-is |
国外
|
|
NIKON NSR 1505G7E光刻机 |
NIKON |
NSR-1505G7E |
- |
6" Working |
国外
|
|
NIKON NSR 2205i12D光刻机 |
NIKON |
NSR-2205i12D |
- |
6"reticle(SMIF), Inline with ACT1 |
国外
|
|
NIKON NSR 2005i9C步进式光刻机 |
NIKON |
NSR-2005i9C |
- |
- |
国外
|
|
NIKON NSR 2205 EX12B光刻机 |
NIKON |
NSR-2205EX12B |
- |
Available Dec, 2021, w/SMIF |
国外
|
|
NIKON NSR 1505G7E光刻机 |
NIKON |
NSR-1505G7E |
- |
w/cymer laser, w/SMIF |
国外
|
|
Advantest T5375 ATE |
Advantest |
T5375 |
- |
single head with PM option |
国外
|
|
KARL SUSS MA200光刻机 |
KARL SUSS |
MA200 |
1989 |
8" Holder , 2x Optic Lens(5x, 10x |
国外
|
|
AMAT Centura DPS2 Metal |
AMAT应用材料 |
Centura DPS2 Metal |
2005 |
EFEM(NT, Yaskawa), 3x G2 Metal, 1 |
国外
|
|
AMAT Centura Axiom Chamber |
AMAT应用材料 |
Centura Axiom Chamber |
2006 |
Axiom Only (w/VODM) |
国外
|
|
Mattson Helios RTP |
Mattson |
Helios |
2009 |
3x TDK TAS300 Load port, 2x Chabm |
国外
|
|
Mattson Helios RTP |
Mattson |
Helios |
2004 |
1. Chamber Qty. =2 2. transforme |
国外
|
|
Mattson Helios RTP |
Mattson |
Helios |
2004 |
3x TDK TAS300 Load port, 2x Chabm |
国外
|
|
Mattson Helios RTP |
Mattson |
Helios |
2005 |
3x TDK TAS300 Load port, 2x Chabm |
国外
|
|
Agilent 4073B ATE |
Agilent |
4073B |
2005 |
48Pin / SMU:HRSMU(x2), MPSMU(x6) |
国外
|
|
Agilent 4073A ATE |
Agilent |
4073A |
2001 |
32pin(of 32pins, 4pins fail), MP |
国外
|
|
Agilent 4073B ATE |
Agilent |
4073B |
2011 |
48pin, SMU7[MPSMU(4), HPSMU(1), H |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
1988 |
CVD Mark1, 3x DLH |
国外
|
|
TEL LITHIUS Pro-i |
TEL |
LITHIUS Pro-i |
2007 |
9COT 3DEV with many CCHA bake and |
国外
|
|
TEL LITHIUS涂胶显影机 |
TEL |
LITHIUS |
2007 |
5C5D, Inlined type(AT-850F), FOUP |
国外
|
|
AMAT Reflexion FA |
AMAT应用材料 |
Reflexion FA |
2005 |
CMP |
国外
|
|
KARL SUSS CBC200 |
KARL SUSS |
CBC200 |
2013 |
Cluster Frame, Process Module x4, |
国外
|
|
TERADYNE MAGNUM2X 2x GVLC |
TERADYNE |
MAGNUM2X 2x GVLC |
- |
Frame Only. No board included / i |
国外
|
|
TERADYNE MAGNUM2X SSV |
TERADYNE |
MAGNUM2X SSV |
- |
[Missing indicated] : Base Board |
国外
|
|
KARL SUSS CB200M |
KARL SUSS |
CB200M |
2012 |
Process chamber, Transfer Unit. B |
国外
|
|
AMAT Vantage 5 |
AMAT应用材料 |
Vantage 5 |
2012 |
RTP |
国外
|
|
KLA Viper 2435 |
KLA科磊 |
Viper 2435 |
2006 |
- |
国外
|
|
KLA Viper 2438 |
KLA科磊 |
Viper 2438 |
2008 |
- |
国外
|
|
TERADYNE IP750测试系统 |
TERADYNE |
IP750 |
2000 |
512ch head(1), ws(COMPAQ Evo W800 |
国外
|
|
TERADYNE IP750测试系统 |
TERADYNE |
IP750 |
2000 |
512ch head(1), ws(PFU Limited PDS |
国外
|
|
TERADYNE IP750测试系统 |
TERADYNE |
IP750 |
2000 |
512ch head(1), ws(COMPAQ Evo W800 |
国外
|
|
TERADYNE IP750EP测试系统 |
TERADYNE |
IP750EP |
2002 |
512ch head(1), ws(PFU limited PDS |
国外
|
|
TERADYNE IP750测试系统 |
TERADYNE |
IP750 |
2000 |
Power conditioner(1ea, small type |
国外
|
|
TERADYNE UltraFLEX |
TERADYNE |
UltraFLEX |
2011 |
Z800(W/S)36 slot Testhead . HSD-I |
国外
|
|
TERADYNE J750EX测试系统 |
TERADYNE |
J750EX |
2015 |
1024ch size Large TH, DPS(2), CUB |
国外
|
|
TERADYNE IP750EX测试系统 |
TERADYNE |
IP750EX |
2001 |
HEAD(Modified from J750), Rack(Ma |
国外
|
|
TERADYNE J750测试系统 |
TERADYNE |
J750 |
2004 |
韩国 Main, Head, W/S(XW8400), Power |
国外
|
|
SMT |
Famecs |
FMBL-200AND-SHE |
2013 |
- |
国外
|
|
TERADYNE IP750测试系统 |
TERADYNE |
IP750 |
2000 |
512ch head(1), ws(PFU limited PDS |
国外
|
|
TERADYNE IP750S测试系统 |
TERADYNE |
IP750S |
- |
512ch head(1), ws(PFU limited PDS |
国外
|
|
PKG |
Musashi |
AWATRON2 AW-MV310 |
2013 |
Vacuum Pump : 2Torr, 100l/min. |
国外
|
|
NIKON N-SIS超分辨率显微镜 |
NIKON |
N-SIS 5 |
- |
- |
国外
|
|
NIKON N-SIS超分辨率显微镜 |
NIKON |
N-SIS 5 |
- |
- |
国外
|
|
NIKON N-SIS超分辨率显微镜 |
NIKON |
N-SIS 5 |
- |
- |
国外
|
|
NIKON N-SIS超分辨率显微镜 |
NIKON |
N-SIS 5 |
- |
- |
国外
|
|
NIKON N-SIS超分辨率显微镜 |
NIKON |
N-SIS 5 |
- |
- |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2004 |
4 x CVD TiN, 3 x load port FI ro |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2011 |
Trias E+, UV RF CH x3 |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2006 |
Ti Ch x2, TiN Ch x2, Stage Heater |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2012 |
3CH |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2013 |
EXII ALD TiN 1CH System |
国外
|
|
TEL Trias SPA CVD |
TEL |
Trias SPA |
2010 |
LM+TM+AC Rack, Missing: PM |
国外
|
|
ACCRETECH UF3000探针台 |
ACCRETECH东京精密 |
UF3000 |
2007 |
Right Single Loader, Hot Nickel C |
国外
|
|
AXCELIS RapidCure 320FC Track |
AXCELIS |
RapidCure 320FC |
2007 |
- |
国外
|
|
NITTO HR8500II撕膜机 |
NITTO |
HR8500II |
2002 |
5,6,8" Universal Chuck, Loader/Un |
国外
|
|
AMAT Centura DPS2 Metal |
AMAT应用材料 |
Centura DPS2 Metal |
2005 |
EFEM(Server, Yaskawa), 3x G2 Meta |
国外
|
|
AMAT Producer GT CVD |
AMAT应用材料 |
Producer GT |
2011 |
3 Twin(HARP USG, RPC_FI80131), FI |
国外
|
|
AMAT Producer GT Chamber CVD |
AMAT应用材料 |
Producer GT Chamber |
2010 |
1 Twin CH(ACL) only |
国外
|
|
KLA Spectra FX200薄膜量测 |
KLA科磊 |
FX200 |
2006 |
[Power-on] 2port(TDK), Yaskawa(Al |
国外
|
|
Micromanipulator 9000-VIT |
Micromanipulator |
9000-VIT |
2005 |
- |
国外
|
|
TEL TSP 305 SCCM TE Etch |
TEL |
TSP 305 SCCM TE |
2007 |
3x TE configured |
国外
|
|
Component |
Blue M |
DCC-206-EV-ST350 |
1999 |
- |
国外
|
|
EBARA EST 300 |
EBARA |
EST-300 |
- |
- |
国外
|
|
EBARA EST200WN |
EBARA |
EST-200WN |
- |
- |
国外
|
|
Metrology |
VLSI Standard |
PDS-100 |
2000 |
Particle Counters in Metrology Eq |
国外
|
|
Advantest 83000 ATE |
Advantest |
83000 |
2000 |
- |
国外
|
|
Advantest 83000 ATE |
Advantest |
83000 |
- |
- |
国外
|
|
Advantest 83000 ATE |
Advantest |
83000 |
- |
- |
国外
|
|
Metrology |
VEECO |
V220SI |
- |
- |
国外
|
|
Component |
ITS |
Single Mix Tank |
- |
- |
国外
|
|
Electroglas EG2001X ATE |
Electroglas |
EG2001X |
- |
- |
国外
|
|
Component |
Blue M |
RG-3010F-2 |
- |
System S/N: R2-606 |
国外
|
|
Steag ElectroDep 2000 Etch |
Steag |
ElectroDep 2000 |
2000 |
- |
国外
|
|
AG Associates Steag Etch |
AG Associates |
Steag |
- |
- |
国外
|
|
Component |
Oryx |
M65X |
- |
- |
国外
|
|
Component |
Oryx |
M65X |
- |
- |
国外
|
|
Electroglas EG4090u ATE |
Electroglas |
EG4090u |
1999 |
Tool was functional when powered |
国外
|
|
Electroglas EG4090u ATE |
Electroglas |
EG4090u |
1999 |
Tool was functional when powered |
国外
|
|
Electroglas EG4090u ATE |
Electroglas |
EG4090u |
1999 |
Tool was functional when powered |
国外
|
|
Electroglas EG4090u ATE |
Electroglas |
EG4090u |
2004 |
Tool was functional when powered |
国外
|
|
Metrology |
PMS |
Lasair 110 |
2013 |
- |
国外
|
|
WET |
GTX |
Wet Bench |
- |
- |
国外
|
|
Kinetic Systems 9101-21-21 |
Kinetic Systems |
9101-21-21 |
1994 |
- |
国外
|
|
Component |
Akrion |
UP V2 MP.2000 |
- |
Bagged & Skidded in warehouse |
国外
|
|
Component |
Thermo Fisher Scientific |
FED720 |
- |
- |
国外
|
|
Component |
Feedmatic |
Vacuum Sealer |
1997 |
- |
国外
|
|
Component |
Akrion |
UP V2 MP.2000 |
1999 |
Bagged & Skidded in warehouse |
国外
|
|
KLA CRS1010 |
KLA科磊 |
CRS1010 |
1998 |
Microscope |
国外
|
|
WET |
Autoclean |
ISG-2000 |
- |
- |
国外
|
|
Component |
Akrion |
UP V2 MP.2000 |
2000 |
- |
国外
|
|
Component |
Akrion |
UP V2 MP.2000 |
2000 |
Bagged & Skidded in warehouse |
国外
|
|
Component |
Akrion |
UP V2 MP.2000 |
- |
Main system 1, Fire suppression 2 |
国外
|
|
Component |
Sonicor Instrument |
TS-2404/402424H |
- |
- |
国外
|
|
Unknown Parts Clean Box-Exhaust |
Unknown |
Parts Clean Box-Exhausted |
1995 |
for Parts Cleaning |
国外
|
|
LAM Synergy CMP |
LAM泛林 |
Synergy |
1997 |
- |
国外
|
|
WET |
Akrion |
MP-2000 |
2000 |
Unhooked, dismatlted and packed |
国外
|
|
HITACHI AS5000 |
HITACHI |
AS5000 |
1997 |
Metrology / SEMs in?Microscopes, |
国外
|
|
Component |
Thermo Fisher Scientific |
FED720 |
- |
- |
国外
|
|
LASERTEC PEGSIS P100 |
LASERTEC |
PEGSIS P100 |
2011 |
- |
国外
|
|
Component |
Thermo Fisher Scientific |
FD400 |
1995 |
- |
国外
|
|
Component |
Jackson Automation |
EXHAUST BOX |
2000 |
Implant / Clean Room Equipment in |
国外
|
|
Component |
Jackson Automation |
Exhaust Cabinet |
- |
- |
国外
|
|
Component |
Blue M |
DCC206CY |
1995 |
- |
国外
|
|
Component |
Jackson Automation |
Exhaust Cabinet |
- |
- |
国外
|
|
Metrology |
JEOL |
JWS-7515 |
1999 |
- |
国外
|
|
WET |
Pan Abrasives |
KS9090WB/SS4 |
- |
- |
国外
|
|
AG Associates Extraction, Amine |
AG Associates |
Extraction, Amine |
2000 |
- |
国外
|
|
Component |
Thermo Fisher Scientific |
FD400 |
- |
- |
国外
|
|
Component |
Thermo Fisher Scientific |
FED720 |
- |
- |
国外
|
|
Nanometrics Q200I |
Nanometrics |
Q200I |
2000 |
2 X Indexer |
国外
|
|
Component |
NCB Network |
NF200 |
2007 |
- |
国外
|
|
KLA Polylite 88 |
KLA科磊 |
Polylite 88 |
- |
- |
国外
|
|
Component |
Blue M |
DCC206CY |
- |
- |
国外
|
|
Temptronic TPO4000A-2B21-2 ATE |
Temptronic |
TPO4000A-2B21-2 |
2008 |
location : Singapore |
国外
|
|
PKG |
Blue M |
DCC-1406CY |
1995 |
Convection Bake Oven |
国外
|
|
Semilab SPVCMS4000 |
Semilab |
SPVCMS4000 |
1995 |
- |
国外
|
|
Sonicar TS-12047HC |
Sonicar |
TS-12047HC |
- |
- |
国外
|
|
SMT |
UNIVERSAL PLASTICS |
Solvent Bench |
1995 |
Heating of Flow-Flashpoint Solven |
国外
|
|
Metrology |
JEOL |
JWS-7555 |
2002 |
- |
国外
|
|
Metrology |
JEOL |
JWS-7555 |
2000 |
- |
国外
|
|
Furnace |
BTU |
TCAS 181-7-72-E-36 |
2001 |
Controlled Atmosphere Furnace |
国外
|
|
KARL SUSS XBC300晶圆键合机 |
KARL SUSS |
XBC300 |
- |
300mm Wafer/ Glass Bonder |
国外
|
|
SCREEN SU-3100 WET |
SCREEN |
SU-3100 |
2011 |
8 chambers BEOL single wafer clea |
国外
|
|
TEL Alpha-303i Furnace |
TEL |
Alpha-303i |
- |
VMM-56-002, 2 boats, SiH4, PH3, C |
国外
|
|
AMAT Centura Enabler Etch |
AMAT应用材料 |
Centura Enabler |
2007 |
- |
国外
|
|
Component |
Adixen |
APR4300 |
2014 |
In crate, In warehouse |
国外
|
|
Component |
Adixen |
APR4300 |
2014 |
Unhooked. In warehouse |
国外
|
|
Advantest 83000 |
Advantest |
83000 |
2000 |
Tester, F330t , 256 pins |
国外
|
|
Advantest 83000 |
Advantest |
83000 |
2000 |
Tester, F330t , 128 pins |
国外
|
|
Agilent 81110A |
Agilent |
81110A |
- |
- |
国外
|
|
KOKUSAI DJ-1206VN-DM |
KOKUSAI |
DJ-1206VN-DM |
2006 |
- |
国外
|
|
TEL Alpha-303i Furnace |
TEL |
Alpha-303i |
- |
VMM-56-002, 2 boats |
国外
|
|
TEL Alpha-303i Furnace |
TEL |
Alpha-303i |
- |
VMM-56-002, 2 boats, SiH4, PH3, C |
国外
|
|
TEL Alpha-303i Furnace |
TEL |
Alpha-303i |
- |
VMM-56-002, 2 boats, SiH4, PH3, C |
国外
|
|
Component |
KINIK |
BI2 |
- |
- |
国外
|
|
SCREEN SU-3100 WET |
SCREEN |
SU-3100 |
2011 |
8 chambers single wafer clean |
国外
|
|
SCREEN SU-3100 WET |
SCREEN |
SU-3100 |
2013 |
8 chambers single wafer clean |
国外
|
|
Jordan Valley JVX6200i |
Jordan Valley |
JVX6200i |
2011 |
- |
国外
|
|
Metrology |
Toray |
HS-830 |
2010 |
- |
国外
|
|
TEL nFusion 700 Implant |
TEL |
nFusion 700 |
2013 |
- |
国外
|
|
Novellus Inova NExT PVD |
Novellus |
Inova NExT |
2007 |
3ports, 4x Ti, 2x AlCu, Degas |
国外
|
|
AXCELIS COMPACT II Furnace |
AXCELIS |
COMPACT II |
- |
- |
国外
|
|
Semitool Raider ECD310 |
Semitool |
Raider ECD310 |
2006 |
Capsule (Cleanning Chamber)x4, EC |
国外
|
|
Metrology |
PSS |
AccuSizer APS 780 |
2006 |
- |
国外
|
|
Semitool Raider ECD310 |
Semitool |
Raider ECD310 |
2007 |
- |
国外
|
|
Semitool Raider ECD310 |
Semitool |
Raider ECD310 |
2007 |
- |
国外
|
|
Rudolph WV320 |
Rudolph |
WV320 |
2007 |
- |
国外
|
|
Metrology |
Phoenix |
Micromex SE 160T |
2009 |
Xray tool |
国外
|
|
KOKUSAI DD-1236VN-DF |
KOKUSAI |
DD-1236VN-DF |
- |
"need exact model name"
DJ-1236V |
国外
|
|
KOKUSAI DD-1223VN |
KOKUSAI |
DD-1223VN |
- |
Single boat, CX5000 |
国外
|
|
Furnace |
ASM |
A412 |
2011 |
2boats |
国外
|
|
Mattson Steag Etch |
Mattson |
Steag |
2002 |
- |
国外
|
|
AMAT Centura Chamber Etch |
AMAT应用材料 |
Centura Chamber |
2010 |
2 x Minos, 1 x Carina, 1 x Axion, |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2010 |
- |
国外
|
|
AXCELIS Optima HDxT Implant |
AXCELIS |
Optima HDxT |
2011 |
Axcelis Optima HDxT
Roughing |
国外
|
|
Component |
Chiron |
XACT-830 |
- |
- |
国外
|
|
KLA Viper 2438 |
KLA科磊 |
Viper 2438 |
2010 |
- |
国外
|
|
KLA Tencor ES31晶圆检查系统 |
KLA科磊 |
ES31 |
2004 |
E-beam Inspection / SEMs in Micro |
国外
|
|
GEMETEC Elymat III |
GEMETEC |
Elymat III |
- |
- |
国外
|
|
AMAT NanoSEM 3D Metrology |
AMAT应用材料 |
NanoSEM 3D |
2002 |
MULTIPLE UNITS AVAILABLE. PLEASE |
国外
|
|
AMAT NanoSEM 3D Metrology |
AMAT应用材料 |
NanoSEM 3D |
2002 |
ULTIPLE UNITS AVAILBLE. PLEASE I |
国外
|
|
Multiprobe MP1 ATE |
Multiprobe |
MP1 |
2006 |
Condition Very Good, tool for mi |
国外
|
|
Novellus Inova NExT PVD |
Novellus |
Inova NExT |
2015 |
3ports, 2x AlCu, 2x Ti, Degas |
国外
|
|
Metrology |
HSEB |
AXIOSPECT 301 |
- |
- |
国外
|
|
Etch |
Shibaura |
CDE300 |
- |
Main mini environment Platform, E |
国外
|
|
WET |
Semitool |
Raider SP |
2006 |
- |
国外
|
|
KARL SUSS HVMMFT |
KARL SUSS |
HVMMFT |
- |
- |
国外
|
|
KARL SUSS HVMMFT |
KARL SUSS |
HVMMFT |
- |
- |
国外
|
|
Kinetic Systems Megapure 6001 HC |
Kinetic Systems |
Megapure 6001 HC |
- |
- |
国外
|
|
Component |
Adixen |
APR4300 |
2012 |
4 process chambers, 1 load port, |
国外
|
|
AMAT Centura Enabler Chamber Etch |
AMAT应用材料 |
Centura Enabler Chamber |
2004 |
Condition : Very Good , CE Marked |
国外
|
|
AMAT Vantage Vulcan RTP |
AMAT应用材料 |
Vantage Vulcan |
2013 |
2 Chamber RTP System |
国外
|
|
Metrology |
SOPRA |
EP12 |
- |
- |
国外
|
|
Advantest 83000 |
Advantest |
83000 |
2000 |
Tester, F330t , 64 pins |
国外
|
|
SemiProbe PS4L FA-12 ATE |
SemiProbe |
PS4L FA-12 |
2012 |
with FOUP capablity |
国外
|
|
Track |
SCREEN |
DT-3000 |
2015 |
DUO 4 CUP + 12 PCDH + 6 CP 4 CUP |
国外
|
|
TEL RLSA-H Chambers Etch |
TEL |
RLSA-H Chambers |
2011 |
Dry Etch, Bx-, Cx-, E1 layers, 30 |
国外
|
|
E.A. Fischione 2040 |
E.A. Fischione Instruments |
2040 |
- |
- |
国外
|
|
Waters 2695 |
Waters |
2695 |
- |
- |
国外
|
|
Component |
Blue M |
DCC206CY |
- |
- |
国外
|
|
AMAT Producer GT Chamber CVD |
AMAT应用材料 |
Producer GT Chamber |
2014 |
Parts Machine: 1 x Proudcer GT ch |
国外
|
|
Mattson Helios RTP |
Mattson |
Helios |
2007 |
- |
国外
|
|
Metrology |
FEI |
Ex-Situ Plucker |
2009 |
- |
国外
|
|
HITACHI HF-2000电子显微镜 |
HITACHI |
HF-2000 |
1995 |
200KeV Advanced Analytical TEM |
国外
|
|
Novellus Inova NExT PVD |
Novellus |
Inova NExT |
2013 |
3ports, 2x TiN, 2x Degas |
国外
|
|
Etch |
Nippon Scientific |
PS102W |
- |
- |
国外
|
|
Metrology |
Carl Zeiss |
LEA1530 |
2002 |
FIELD EMISSION SCANNING ELECTRON |
国外
|
|
Metrology |
FEI |
ExSolve 2 WTP EFEM |
2017 |
Main system, Handler (2ports), Pr |
国外
|
|
Metrology |
FEI |
Ex-Situ Plucker |
2008 |
- |
国外
|
|
Metrology |
JEOL |
ARM200CF Super X |
2014 |
Main system |
国外
|
|
Component |
E.A. Fischione Instruments |
1030 |
2005 |
System S/N: 14 |
国外
|
|
ANCOSYS P13010 |
ANCOSYS |
P13010 |
2011 |
- |
国外
|
|
CHECKPOINT 300 TDE |
CHECKPOINT |
300 TDE |
2011 |
Top down OBIRCH/InGaAs/LTM 9 Ghz |
国外
|
|
Metrology |
Hermes Microvision |
eP4 |
2017 |
- |
国外
|
|
HITACHI M-8190XT Etch |
HITACHI |
M-8190XT |
2013 |
3 Chambers |
国外
|
|
Metrology |
Jordan Valley |
JVX7300 |
2012 |
TFM_THK_JV |
国外
|
|
LYNCEE TEC Holographic Microscope |
LYNCEE TEC |
Holographic Microscope |
2012 |
- |
国外
|
|
TERADYNE Probe Card Interface |
TERADYNE |
Probe Card Interface |
2011 |
- |
国外
|
|
TEL Tactras Vigus-0 Etch |
TEL |
Tactras Vigus-0 |
2010 |
NCCP |
国外
|
|
TEL Certas LEAGA Etch |
TEL |
Certas LEAGA |
2016 |
In a line. SW V1.90, Certas LEAGA |
国外
|
|
Component |
VWR Scientific |
1601 |
2011 |
- |
国外
|
|
AMAT Olympia CVD |
AMAT应用材料 |
Olympia |
2015 |
2Ch ALD System, Single chamber, I |
国外
|
|
KOKUSAI DJ-1206VN-DM |
KOKUSAI |
DJ-1206VN-DM |
- |
- |
国外
|
|
KOKUSAI DJ-1206VN-DM |
KOKUSAI |
DJ-1206VN-DM |
- |
- |
国外
|
|
AMAT ACMS XT II Component |
AMAT应用材料 |
ACMS XT II |
2005 |
- |
国外
|
|
AMAT ACMS0XT-ASG-E Component |
AMAT应用材料 |
ACMS0XT-ASG-E |
2006 |
- |
国外
|
|
AMAT UVision 5 Metrology |
AMAT应用材料 |
UVision 5 |
2011 |
- |
国外
|
|
AMAT UVision 5 Metrology |
AMAT应用材料 |
UVision 5 |
2012 |
300mm G1 Load Port 2
Moving Monr |
国外
|
|
Nanometrics Q200I |
Nanometrics |
Q200I |
2002 |
2 X Indexer |
国外
|
|
LASERTEC BI100 |
LASERTEC |
BI100 |
2017 |
- |
国外
|
|
Metrology |
RORZE |
RSR160 |
2017 |
- |
国外
|
|
Component |
Brooks |
M1900 |
2018 |
- |
国外
|
|
MCC ABES-V ATE |
MCC |
ABES-V |
2001 |
BI tool (ambient / high temp only |
国外
|
|
MCC ABES-V ATE |
MCC |
ABES-V |
2001 |
single slot screen tool (ambient |
国外
|
|
Track |
SCREEN |
DT-3000 |
2013 |
DUO 4 CUP + 12 PCDH + 6 CP 4 CUP |
国外
|
|
AMAT Centura Carina Chamber Etch |
AMAT应用材料 |
Centura Carina Chamber |
- |
Chamber Only.
Carina Etch Chambe |
国外
|
|
Micro Control Abes Memory PreScreener |
Micro Control |
Abes Memory PreScreener |
2000 |
System S/N: 112, SoftwareVersion |
国外
|
|
Micro Control Abes Memory PreScreener |
Micro Control |
Abes Memory PreScreener |
1999 |
SoftwareVersion :OS/2 |
国外
|
|
Micro Control Abes Memory Test Tool |
Micro Control |
Abes Memory Test Tool |
1999 |
2 Chambers, 16 slots each |
国外
|
|
Micro Control WRP256 ATE |
Micro Control |
WRP256 |
1999 |
2 Chamber 8 Slots Each |
国外
|
|
Micro Control WRP256 ATE |
Micro Control |
WRP256 |
1996 |
SoftwareVersion :OS/2 |
国外
|
|
Camtek X- ACT Metrology |
Camtek |
X- ACT |
2012 |
- |
国外
|
|
Olympus PMG3 |
Olympus |
PMG3 |
- |
- |
国外
|
|
Semilab PS-2000 |
Semilab |
PS-2000 |
2015 |
- |
国外
|
|
Component |
ABB |
IRB120 |
2016 |
- |
国外
|
|
Component |
Advenced Control |
Advenced Control |
2001 |
- |
国外
|
|
Component |
Advenced Control |
Advenced Control |
2006 |
MEE200/WET200 CMS historical data |
国外
|
|
DISCO DFG821划片机 |
DISCO |
DFG821/F8 |
1993 |
- |
国外
|
|
Metrology |
Bruker |
Insight 3D |
2017 |
AFM, Idle in a fab, SW 8.91b36, M |
国外
|
|
Component |
Chemical Safety Technology, In |
Dual drum waste Cabinet |
- |
- |
国外
|
|
Metrology |
Met One |
3313 |
- |
- |
国外
|
|
Component |
Revco |
ULT 2140-5- D30 -40C |
- |
- |
国外
|
|
PKG |
Royal Sovereign |
RSL-2702 |
- |
- |
国外
|
|
Component |
VWR Scientific |
61161-326 |
- |
- |
国外
|
|
Component |
VWR Scientific |
1610 |
- |
- |
国外
|
|
ENTEGRIS LPDF40SS4 |
ENTEGRIS |
LPDF40SS4 |
2019 |
- |
国外
|
|
KOKUSAI DD-1223V |
KOKUSAI |
DD-1223V |
2014 |
DD-1223VN-DF/ QUIXACE-II D2 ALLOY |
国外
|
|
FSI ORION WET |
FSI |
ORION |
2011 |
- |
国外
|
|
Component |
ESCO |
EHWS 8C |
- |
- |
国外
|
|
ASML XT1250B光刻机 |
ASML |
XT1250B |
2005 |
- |
国外
|
|
Component |
Empire Abrasive Equipment |
PF-2632 M-02522 |
2006 |
Blaster leaks at
hopper and door
|
国外
|
|
Track |
SCREEN |
DT-3000 |
2015 |
DUO 4 CUP + 12 PCDH + 6 CP 4 CUP |
国外
|
|
WET |
FSI |
Antares |
2002 |
- |
国外
|
|
WET |
Semitool |
Spectrum 300 |
2012 |
- |
国外
|
|
AXCELIS Summit 300XT RTP |
AXCELIS |
Summit 300XT |
2003 |
- |
国外
|
|
Component |
Blue M |
RG-3010F-2 |
- |
- |
国外
|
|
Component |
Wilt Industries |
4106 |
- |
- |
国外
|
|
Component |
Denton |
Infinity 18 |
2002 |
- |
国外
|
|
Micro Control WRP256 ATE |
Micro Control |
WRP256 |
1999 |
- |
国外
|
|
Metrology |
Carl Zeiss |
Axiotron-2 |
- |
- |
国外
|
|
Metrology |
Carl Zeiss |
Axiotron-2 |
- |
- |
国外
|
|
Component |
FEI |
Meridian-IV |
2013 |
- |
国外
|
|
Component |
FSI |
PWB-48X38X64-3E |
2011 |
- |
国外
|
|
Component |
FSI |
PWB-48X38X64-3E |
2011 |
- |
国外
|
|
Component |
FSI |
PWB-48X38X64-3E |
2011 |
- |
国外
|
|
AMAT Endura II PVD |
AMAT应用材料 |
Endura II |
2006 |
1x DSTTN |
已售出
|
|
Metrology |
FEI |
Ex-Situ Plucker |
2011 |
- |
国外
|
|
WET |
DMS |
Tornado 200 |
2013 |
- |
国外
|
|
Akrion Component UP V2 MP.2000 |
Akrion |
UP V2 MP.2000 |
- |
Tool is sitting in Subfab |
国外
|
|
AMAT NanoSEM 3D Metrology |
AMAT应用材料 |
NanoSEM 3D |
2004 |
Installed. Operational. Loadport |
国外
|
|
AMAT NanoSEM 3D Metrology |
AMAT应用材料 |
NanoSEM 3D |
2004 |
Installed. Operational. |
国外
|
|
AMAT NanoSEM 3D Metrology |
AMAT应用材料 |
NanoSEM 3D |
2004 |
Installed. Operational. |
国外
|
|
Extraction System Inc TMB RTM |
Extraction System Inc |
TMB RTM |
- |
- |
国外
|
|
Component |
Jackson Automation |
Storage Cabinet |
- |
- |
国外
|
|
Rudolph WV320 |
Rudolph |
WV320 |
2005 |
- |
国外
|
|
Nanometrics Caliper Q300 |
Nanometrics |
Caliper Q300 |
2003 |
Overlay Measurement, Connected |
国外
|
|
Nanometrics Caliper Q300 |
Nanometrics |
Caliper Q300 |
2003 |
SEM - Critical Dimension (CD) Mea |
国外
|
|
Nanometrics Caliper Q300 |
Nanometrics |
Caliper Q300 |
2002 |
Nanometrics Caliper Inspection To |
国外
|
|
AMAT Producer GT CVD |
AMAT应用材料 |
Producer GT |
2015 |
3 Chamber: 1x SiCoNi PME, Frontie |
国外
|
|
AMAT Producer GT CVD |
AMAT应用材料 |
Producer GT |
2016 |
Frontier FRONTIER etch for Juncti |
国外
|
|
AMAT Producer GT CVD |
AMAT应用材料 |
Producer GT |
2015 |
Frontier FRONTIER etch for Juncti |
国外
|
|
AMAT Producer GT CVD |
AMAT应用材料 |
Producer GT |
2017 |
Frontier FRONTIER etch for Juncti |
国外
|
|
Ametek/Cameca EX300 |
Ametek/Cameca |
EX300 |
2011 |
Stranded, no potential reuse |
国外
|
|
Ametek/Cameca EX300 |
Ametek/Cameca |
EX300 |
2009 |
Shallow Probe Measurment Tool |
国外
|
|
Component |
FSI |
PWC-48X38X64-3E - Drying Oven |
2011 |
- |
国外
|
|
Novellus Inova XT PVD |
Novellus |
Inova XT |
2003 |
6 Chambers |
国外
|
|
Component |
QCEPT |
QCEPT |
2011 |
- |
国外
|
|
TEL Indy Irad Furnace |
TEL |
Indy Irad |
2007 |
- |
国外
|
|
IMS XTS-FT ATE |
IMS |
XTS-FT |
1998 |
- |
国外
|
|
ASM Epsilon 3200 |
ASM |
Epsilon 3200 |
2005 |
CVD |
国外
|
|
Nanometrics Caliper Q300 |
Nanometrics |
Caliper Q300 |
2002 |
Installed |
国外
|
|
Component |
Hologenix |
MTX 2000/2/MIS SLIPBAY |
2001 |
- |
国外
|
|
Packaging Systems Entry Conveyor |
Packaging Systems |
Entry Conveyor |
2018 |
- |
国外
|
|
Metrology |
M&W Products |
IPRO 7 |
2012 |
for KLA IPRO7 |
国外
|
|
Micro Lithography 7002 ATE |
Micro Lithography |
7002 |
1995 |
- |
国外
|
|
Component |
Akrion |
UP V2 MP.2000 |
1994 |
Main system 1, SMIF ALU 1 |
国外
|
|
Estion E-RETICLE V 4M |
Estion |
E-RETICLE V 4M |
2010 |
- |
国外
|
|
KLA DP2 |
KLA科磊 |
DP2 |
2012 |
DP2 Data Prep Station |
国外
|
|
Component |
Kurita |
Unknown |
2012 |
REGAS UNITS (X2) |
国外
|
|
Component |
True Refrigerator |
S-72-SCI-HC |
2017 |
- |
国外
|
|
Component |
True Refrigerator |
TS-72-SCI-HC |
2000 |
- |
国外
|
|
Component |
Air Liquide |
Fabstream III |
2019 |
SiH4 |
国外
|
|
Component |
PMS |
Surfex200 |
2013 |
- |
国外
|
|
Component |
Polycom |
ISX309 |
2015 |
- |
国外
|
|
Polycom Studio ISX321 Component |
Polycom |
Studio ISX321 |
2014 |
- |
国外
|
|
ASML XT1700Gi光刻机 |
ASML |
XT1700Gi |
2006 |
- |
国外
|
|
FSI ORION WET |
FSI |
ORION |
2005 |
- |
国外
|
|
Mosaid MS4205 ATE |
Mosaid |
MS4205 |
- |
200/400MHz, 16x16y addressing, 36 |
国外
|
|
Component |
Micro Control |
Abes IV |
- |
Condition : Fair, Burn-in Oven to |
国外
|
|
Component |
Micro Control |
WRP64 |
- |
Condition : Fair, Burn-in Oven to |
国外
|
|
Kinetic Systems Megapure 6001 HC |
Kinetic Systems |
Megapure 6001 HC |
- |
Component |
国外
|
|
Component |
MKS |
AX8559 |
- |
- |
国外
|
|
Mattson TiW Etch Tool Component |
Mattson |
TiW Etch Tool |
2002 |
Wet Etch tool, condition : Fair |
国外
|
|
Component |
Control Air |
D-9-L-SM-UM-MOD 184 |
- |
D-9-L-SM-UM LIFT,MODEL#184 TEST P |
国外
|
|
TEL Precio octo ATE |
TEL |
Precio octo |
2017 |
- |
国外
|
|
Rudolph S3000S |
Rudolph |
S3000S |
2011 |
- |
国外
|
|
Rudolph S3000SX |
Rudolph |
S3000SX |
2011 |
- |
国外
|
|
Metrology |
Phoenix |
micromex 160 |
2007 |
- |
国外
|
|
AMAT Octane G2 assy Component |
AMAT应用材料 |
Octane G2 assy |
1999 |
- |
国外
|
|
AMAT Octane G2 assy Component |
AMAT应用材料 |
Octane G2 assy |
1999 |
- |
国外
|
|
Chiron DESTIN EM ATE |
Chiron |
DESTIN EM |
2000 |
- |
国外
|
|
Chiron DESTIN EM ATE |
Chiron |
DESTIN EM |
2001 |
- |
国外
|
|
Chiron XPEQT EM ATE |
Chiron |
XPEQT EM |
2001 |
- |
国外
|
|
Chiron XPEQT EM ATE |
Chiron |
XPEQT EM |
2002 |
- |
国外
|
|
Chiron XPEQT EM ATE |
Chiron |
XPEQT EM |
2002 |
- |
国外
|
|
Chiron XPEQT EM ATE |
Chiron |
XPEQT EM |
2002 |
- |
国外
|
|
Metrology |
Jordan Valley |
BedeMetrix-F |
2006 |
Missing Parts . |
国外
|
|
Chiron DESTIN EM ATE |
Chiron |
DESTIN EM |
2000 |
- |
国外
|
|
WET |
SCREEN |
FC-3000 |
2005 |
- |
国外
|
|
SCREEN FC-3100 WET |
SCREEN |
FC-3100 |
2007 |
6 baths |
国外
|
|
Novellus Inova PVD |
Novellus |
Inova |
2014 |
MDX83x, underutilized in FAB8,
c |
国外
|
|
LAM(Novellus) Vector Express CVD |
LAM(Novellus) |
Vector Express |
2011 |
CVD34x, underutilized at FAB8, us |
国外
|
|
LAM(Novellus) Vector Express CVD |
LAM(Novellus) |
Vector Express |
2011 |
- |
国外
|
|
WET |
Semitool |
Spectrum |
- |
- |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2006 |
- |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2006 |
- |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2006 |
- |
国外
|
|
KOKUSAI DJ-1206VN-DM |
KOKUSAI |
DJ-1206VN-DM |
2005 |
- |
国外
|
|
Nanometrics Caliper |
Nanometrics |
Caliper |
2001 |
Connected. |
国外
|
|
Metrology |
Nova |
T600 |
2014 |
- |
国外
|
|
TEL LITHIUS i Track |
TEL |
LITHIUS i |
2005 |
Missing parts |
国外
|
|
RIGAKU 3272 |
RIGAKU |
3272 |
2005 |
- |
国外
|
|
AXCELIS XT300 Furnace |
AXCELIS |
XT300 |
2001 |
- |
国外
|
|
Metrology |
VEECO |
Dimension X3D |
2006 |
System S/N : 149 |
国外
|
|
Metrology |
FEI |
CLM 3D |
2011 |
- |
国外
|
|
CVD |
Novellus |
C3 Speed chms |
2002 |
- |
国外
|
|
Kinetic Systems MB 331-FDD |
Kinetic Systems |
MB 331-FDD |
2014 |
- |
国外
|
|
Sinfornia SELOP12F25-S7A0021 CMP |
Sinfornia |
SELOP12F25-S7A0021 |
2014 |
- |
国外
|
|
Perkin Elmer AANALYST 600 ATE |
Perkin Elmer |
AANALYST 600 |
2002 |
- |
国外
|
|
LTX CREDENCE D10 |
LTX CREDENCE |
D10 |
2007 |
- |
国外
|
|
Synax SX141 ATE |
Synax |
SX141 |
2005 |
- |
国外
|
|
Component |
ESPEC |
ST-120 |
1998 |
- |
国外
|
|
Component |
UVP |
C-600 |
2001 |
- |
国外
|
|
Temptronic TP04000A-2B21-2 ATE |
Temptronic |
TP04000A-2B21-2 |
2015 |
- |
国外
|
页次:
6
/ 9页 每页:500 设备数:4137
9[1][2][3][4][5][6][7][8][9]: 总共有9页
|
|