| 图 片 |
设备名称 |
制造商 |
型号 |
年份 |
详细配置 |
状 态 |
 |
AMAT Endura 5500 MOCVD气相沉积设备 |
AMAT |
Endura 5500 |
1996 |
6"PVD System,
Can be converted to 8"
Chamber 1: AlSiCu
Chamber 2: Tin 101
Chamber 3: Ti/Tin
Chamber 4: Ti/Tin
Cha |
国外
|
 |
AMAT P-5000 PECVD刻蚀机 |
AMAT |
P-5000 |
1999 |
美国6"2腔 |
国外
|
|
AMAT P-5000 DRY ETCH刻蚀机 |
AMAT |
P-5000 |
1999 |
美国6"ESC 2腔 |
国外
|
 |
AMAT mirra MESA CMP化学机械抛光设备 |
AMAT |
mirra MESA CMP |
2002 |
设备完整不缺件,已翻新在国内; |
国外
|
 |
AMAT Endura II气相沉积设备 |
AMAT |
Endura II |
- |
有2台现货; |
国内
|
 |
AMAT Endura CL PVD气相沉积设备 |
AMAT |
Endura CL |
1994 |
1台主机+IMP舱室+2个舱室+1台EFEM; |
国内
|
 |
AMAT CENTRIS MESA ETCH沉积蚀刻 |
AMAT |
CENTRIS MESA ETCH |
- |
有2台现货(1个主机+3个双室,射频机器人涡轮配件齐); |
国内
|
 |
AMAT Endura II PVD 9个腔室气相沉积设备 |
AMAT |
Endura II PVD 9 |
2007 |
12"设备完整不缺件,目前设备在韩国仓库;
AL 2室、TTN 1室、SIP 2室、ALPS 1室、PcXT 1室、Degas（STD）2室 |
国外
|
 |
AMAT Endura II PVD 8个腔室气相沉积设备 |
AMAT |
Endura II PVD 8 |
2007 |
12"设备完整不缺件,目前设备在韩国仓库;
SIP 1室、ALPS 3室、PcXT 2室、Degas(DMD)2室 |
国外
|
 |
AMAT P5000刻蚀机 |
AMAT |
P5000 |
- |
设备完整不缺件,有现货1台; |
国内
|
|
AMAT Centura 5200刻蚀机 |
AMAT |
Centura 5200 |
- |
设备完整不缺件,8英寸3腔表观系统; |
国外
|
 |
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
1996 |
CVD 3chamber;nitride
CVD 4chamber;Teos hot box type
Etch mxp 3chamber |
国外
|
|
AMAT 8330干法刻蚀机 |
AMAT应用材料 |
8330 |
1990.7 |
6"最大1801W,18片/炉,机械手传片; |
国内
|
|
AMAT 8330干法刻蚀机 |
AMAT应用材料 |
8330 |
1990.2 |
6"最大1801W,18片/炉,机械手传片; |
国内
|
|
AMAT AMS-2100干法刻蚀机 |
AMAT应用材料 |
AMS-2100 |
- |
在线热机; |
国内
|
|
AMAT 8310干法刻蚀机 |
AMAT应用材料 |
8310 |
1988.6 |
6"最大1801W,18片/炉,机械手传片; |
国内
|
|
AMAT 8330干法刻蚀机 |
AMAT应用材料 |
8330 |
1991.4 |
6"最大1801W,18片/炉,机械手传片; |
国内
|
|
AMAT 8330干法刻蚀机 |
AMAT应用材料 |
8330 |
1990.7 |
6"最大1801W,18片/炉,机械手传片; |
国内
|
|
AMAT 8330干法刻蚀机 |
AMAT应用材料 |
8330 |
1990.5 |
6"最大1801W,18片/炉,机械手传片; |
国内
|
|
AMAT 8310干法刻蚀机 |
AMAT应用材料 |
8310 |
1991.5 |
6"最大1801W,18片/炉,机械手传片; |
国内
|
|
AMAT 8310干法刻蚀机 |
AMAT应用材料 |
8310 |
1990 |
6"最大1801W,18片/炉,机械手传片; |
国内
|
|
AMAT 8330干法刻蚀机 |
AMAT应用材料 |
8330 |
1988.8 |
6"最大1801W,18片/炉,机械手传片; |
国内
|
|
AMAT 8330干法刻蚀机 |
AMAT应用材料 |
8330 |
- |
6"最大1801W,18片/炉,机械手传片,备件机; |
国内
|
|
AMAT 8310干法刻蚀机 |
AMAT应用材料 |
8310 |
1992.6 |
6"最大1801W,18片/炉,机械手传片; |
国内
|
|
YAMATO DKN402烤箱 |
YAMATO |
DKN402 |
- |
- |
国外
|
|
AMAT 8310刻蚀机 |
AMAT应用材料 |
8310 |
1991.5 |
在购热机 6" 刻压点;18片/炉;最大1800W;机械手传片 |
国外
|
|
AMAT 8310刻蚀机 |
AMAT应用材料 |
8310 |
1988.6 |
在购热机 6" 刻压点;18片/炉;最大1800W;机械手传片 |
国外
|
|
AMAT 8330刻蚀机 |
AMAT应用材料 |
8330 |
1988.8 |
在购热机 6" 刻AL;18片/炉;最大1800W;机械手传片 |
国外
|
|
AMAT 8330刻蚀机 |
AMAT应用材料 |
8330 |
1990.2 |
在购热机 6" 刻AL;18片/炉;最大1800W;机械手传片 |
国外
|
|
AMAT 8310刻蚀机 |
AMAT应用材料 |
8310 |
1992.6 |
在购热机 6" 刻压点;18片/炉;最大1800W;机械手传片 |
国外
|
|
AMAT 8330刻蚀机 |
AMAT应用材料 |
8330 |
1990.7 |
在购热机 6" 刻AL;18片/炉;最大1800W;机械手传片 |
国外
|
|
AMAT 8330刻蚀机 |
AMAT应用材料 |
8330 |
1991.4 |
在购热机 6" 刻AL;18片/炉;最大1800W;机械手传片 |
国外
|
|
AMAT 8330刻蚀机 |
AMAT应用材料 |
8330 |
1990.5 |
在购热机 6" 刻AL;18片/炉;最大1800W;机械手传片 |
国外
|
|
AMAT 8330刻蚀机 |
AMAT应用材料 |
8330 |
1990.7 |
在购热机 6" 刻AL;18片/炉;最大1800W;机械手传片 |
国外
|
|
AMAT 8330刻蚀机 |
AMAT应用材料 |
8330 |
- |
6"有1台; |
国内
|
|
AMAT 8110刻蚀机 |
AMAT应用材料 |
8110 |
- |
6"有1台; |
国内
|
|
AMAT AMC 7811外延炉 |
AMAT |
AMC-7811 |
- |
6"有8台 |
国内
|
|
AMAT 7700外延炉 |
AMAT应用材料 |
7700 |
- |
6"有2台; |
国内
|
|
AMAT MATERIALS CENTURA ENABLER干法刻蚀设备 |
AMAT应用材料 |
MATERIALS CENTURA ENABLER |
2008 |
System
AC Rack
Monitor
Missing robots
2008 vintage. |
国外
|
|
AMAT MATERIALS Centura HTF EPI外延沉积 |
AMAT应用材料 |
MATERIALS Centura HTF EPI Syst |
- |
美国已下线 |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
- |
8'' CVD |
国外
|
|
AMAT P5000 PLIS刻蚀机 |
AMAT应用材料 |
P5000 PLIS |
- |
翻新机Standard TEOS USG x3 Chamber |
国外
|
|
AMAT Centura2 DPS+Poly Etch干法蚀刻机 |
AMAT应用材料 |
Centura2 DPS+Poly Etch |
- |
8 As-is |
国外
|
|
AMAT Centura Ultima等离子化学气相沉积 |
AMAT应用材料 |
Centura Ultima |
- |
8 As-is |
国外
|
|
AMAT Centura Ultima HDP等离子化学气相沉积 |
AMAT应用材料 |
Centura Ultima HDP |
- |
8 As-is |
国外
|
|
AMAT Amat Centura2 DSP等离子化学气相沉积 |
AMAT应用材料 |
Amat Centura2 DSP |
- |
8 As-is |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
- |
FULL REPUB |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
- |
8 REFURB |
国外
|
|
AMAT Producer-GT CVD化学气相沉积 |
AMAT应用材料 |
Producer-GT CVD |
- |
As-is |
国外
|
|
AMAT mirra MESA CMP化学机械抛光设备 |
AMAT |
mirra MESA CMP |
- |
FULL REPUB |
国外
|
|
AMAT Producer GT CVD化学气相沉积设备 |
AMAT |
Producer GT |
2007 |
晶圆尺寸：300mm
生产者 GT： 配置
FI：5.4
服务器：IBM 306m FI
机器人：Kawasaki x2ea FI
机器人控制器：Kawasaki x2ea(型号：30D61H-A203)
加载端口：4 端口
|
国外
|
|
AMAT Producer GT CVD化学气相沉积设备 |
AMAT |
Producer GT |
2008 |
晶圆尺寸：300mm
生产者GT：配置FI
类型：SFEM(制造商：MATTSON)
FI 机器人：SFEM Dual BladeType
FI 机器人控制器：未知
负载端口：2 端口
计量：NA UPS：Powerwa |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
- |
2CH / 3CH |
国外
|
|
AMAT Vera SEM 3D测量系统 |
AMAT应用材料 |
Vera SEM 3D |
- |
Metrology |
国外
|
|
AMAT Vera SEM 3D测量系统 |
AMAT应用材料 |
Vera SEM 3D |
- |
Metrology |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
1995 |
2 chambers CVD
3 chambers CVD |
国外
|
|
AMAT Centura 5200刻蚀机 |
AMAT |
Centura 5200 |
- |
CVD System,6"(3)Chambers. |
国外
|
|
AMAT Centura AP Minos Polysili蚀刻机 |
AMAT |
Centura AP Minos Polysili |
- |
- |
国内
|
|
AMAT MATERIALS CENTURA AP MINOS蚀刻机 |
AMAT应用材料 |
APPLIED MATERIALS CENTURA AP M |
- |
- |
国外
|
|
AMAT 8310氧化物蚀刻器 |
AMAT应用材料 |
8310 |
- |
8" |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
- |
- |
国内
|
|
AMAT Centura DPS2 Poly Etch等离子体蚀刻设备 |
AMAT应用材料 |
Centura DPS2 Poly |
2007 |
EFEM, TM, 3x DPS2 Poly; 1x Axiom, AC Rack, Side Storage, EE-EAS-12 |
国外
|
|
AMAT P5000刻蚀机 |
AMAT |
P5000 |
1996 |
CVD MarkII, 2x DLH_Delta, 2x Etch |
国外
|
|
AMAT Centura DPS2 Chamber等离子体蚀刻设备 |
AMAT |
Centura DPS2 Chamber |
- |
DPS2 Poly Chamber, Parts |
国外
|
|
AMAT Centura DPS Metal Etch刻蚀机 |
AMAT |
Centura DPS Metal |
1996 |
C1P1, WBLL, 1x Orient, 1x CD, 2x DPS R0, 2x ASP, AC Rack, Modified Generator Rack, Missing: VME Board, Process kit, etc |
国外
|
|
AMAT Centura eMax CT+ Etch蚀刻机 |
AMAT |
Centura eMax CT+ |
2007 |
EFEM(Server, Yaskawa), TM, 3x eMaX CT+, AC Rack, Generator Rack |
国外
|
|
AMAT Producer SE CVD化学气相沉积设备 |
AMAT |
Producer SE |
2009 |
2x BDII 1x UV Cure |
国外
|
|
AMAT Centura eMax CT+ Etch蚀刻机 |
AMAT |
Centura eMax CT+ |
2007 |
EFEM, TM, 3x eMax, AC Rack, Side Storage |
国外
|
|
AMAT Centura DPS2 Metal Etch等离子体蚀刻设备 |
AMAT |
Centura DPS2 Metal |
2005 |
EFEM(Server, Kawasaki), 3x G2 Metal, AC Rack, 1x Side Storage, 2x SMC Chiller, 3x Cathode Chiller, Utility Box, Tote |
国外
|
|
AMAT Centura DPS2 Chamber Etch等离子体蚀刻设备 |
AMAT |
Centura DPS2 Chamber |
- |
DPS2 Poly Chamber, Parts |
国外
|
|
AMAT Centura DPS2 Chamber等离子体蚀刻设备 |
AMAT |
Centura DPS2 Chamber |
- |
DPS2 Poly Chamber, Parts |
国外
|
|
AMAT Centura DPS2 AdvantEdge G等离子体蚀刻设备 |
AMAT |
Centura DPS2 AdvantEdge G5 Mes |
2007 |
G5 Mesa. EFEM(Server, Kawasaki) 3x G5 Mesa, 1x Axiom, AC Rack, UPS racks, AE Top match, 2x Side Storage, Tote |
国外
|
|
AMAT Producer SE CVD化学气相沉积设备 |
AMAT |
Producer SE |
2004 |
HT-SiN 3 Twin, OS_FES(CGA), FInRT(Longflex Type, CPCI7236), RPC_NPP, Throttle Valve Localized |
国外
|
|
AMAT Centura DPS2 Poly Etch等离子体蚀刻设备 |
AMAT应用材料 |
Centura DPS2 Poly |
2006 |
EFEM, TM, 3x DPS2 Poly, 1x Axiom, AC Rack |
国外
|
|
AMAT Centura Enabler刻蚀机 |
AMAT |
Centura Enabler |
2008 |
EFEM(Server, Yaskawa), TM(VHP), 3x Enabler, AC Rack, RF Rack(ENI B5002, GHW 50A), 1x Side Storage, Parts |
国外
|
|
AMAT Producer GT CVD化学气相沉积设备 |
AMAT |
Producer GT |
2003 |
Polisher STD, Desica Cleaner |
国外
|
|
AMAT Producer SE CVD化学气相沉积设备 |
AMAT应用材料 |
Producer SE |
2007 |
3Twin ACL(HF and LF Gen), Server Type, LCF, Power-On Condition |
国外
|
|
AMAT Producer SE CVD化学气相沉积设备 |
AMAT应用材料 |
Producer SE |
2003 |
2 Twiin( HF_Apex3013, LF_PDX9002V, RPC_FI20620-1), OS_Server Type, LP_TDK 2ea, |
国外
|
|
AMAT Endura II气相沉积设备 |
AMAT |
Endura II |
2004 |
EFEM, TM, 2x PCII, 2x IMP, 1x TxZ |
国外
|
|
AMAT Centura DPS2 532 Metal等离子体蚀刻设备 |
AMAT应用材料 |
Centura DPS2 532 Metal |
2006 |
EFEM(Yaskawa), 2xDPS532, 1xAxiom, AC Rack, Power On condition |
国外
|
|
AMAT Uvision 4量测设备 |
AMAT |
UVision 4 |
- |
Parts Sale Available
If you need any demand for specific parts, please inquire. |
国外
|
|
AMAT Centura DPS2 Poly Etch等离子体蚀刻设备 |
AMAT应用材料 |
Centura DPS2 Poly |
2006 |
EFEM(Kawasaki, Server), TM, 3x G5, 1x Axiom(No VODM), AC Rack, Chiller |
国外
|
|
AMAT Centura Avatar Etch刻蚀机 |
AMAT |
Centura Avatar |
- |
AVATAR 4x Chamber only |
国外
|
|
AMAT Uvision 4量测设备 |
AMAT |
UVision 4 |
2009 |
[As-is]2ea*TDK load port, Kawasaki Robot, stage locking.
*Parts Sale Available
If you need any demand for specific par |
国外
|
|
AMAT AMC7821外延炉 |
AMAT |
AMC7821 |
1983 |
epitaxy |
国外
|
|
AMAT AMC7800RPX外延炉 |
AMAT |
AMC7800RPX |
1982 |
Epitaxy |
国外
|
|
AMAT AMC7811外延炉 |
AMAT |
AMC-7811 |
1990 |
Epitaxy |
国外
|
|
AMAT Orbot WF720晶圆检测系统 |
AMAT |
Orbot WF720 |
- |
- |
国外
|
|
AMAT Producer SE CVD化学气相沉积设备 |
AMAT |
Producer SE |
2007 |
ACL Process, 2 Twin Ch(HF_Apex3013, RPC_MKS AX7685-20), Operation System: Server Type, LCF Option. Missing: loadlock pum |
国外
|
|
AMAT Centura eMax CT+ Etch蚀刻机 |
AMAT |
Centura eMax CT+ |
2004 |
EFEM, TM, 3x eMaX CT+, AC Rack |
国外
|
|
AMAT Centura eMax CT+ Etch蚀刻机 |
AMAT |
Centura eMax CT+ |
2006 |
EFEM(Server, Single Yaskawa), TM, eMaX CT+, AC Rack, Generator Rack, |
国外
|
|
AMAT Centura Enabler刻蚀机 |
AMAT |
Centura Enabler |
2006 |
EFEM(NT, Yaskawa, missing Blade), TM(VH), 3x Enabler(Simatsu Turbo), AC Rack, Generator Rack(ENI B5002, missing Spectrum |
国外
|
|
AMAT Endura CL PVD气相沉积设备 |
AMAT |
Endura CL |
2000 |
EFEM(2 Ports, Kensington), XP Robot, 2x Degas, 1x TTN, 1x AL, 1x ALPS, Cryo Genics Chiller |
国外
|
|
AMAT DPS2 532 Metal Chamber Etch刻蚀机 |
AMAT |
DPS2 532 Metal Chamber |
2004 |
DPS2 532 Metal Chamber only |
国外
|
|
AMAT Centura Enabler E2刻蚀机 |
AMAT |
Centura Enabler E2 |
2010 |
EFEM(Server, Yaskawa), TM(VHP), 3x Enabler E2, AC Rack(w/CVCF),RF Rack(ENI B5002, GHW 50A), 2x Side Storage, Parts, miss |
国外
|
|
AMAT P5000刻蚀机 |
AMAT |
P5000 |
- |
在线热机,有2台; |
国外
|
|
AMAT Centura AP ISPRINT CVD化学气相沉积设备 |
AMAT |
Centura AP ISPRINT |
2008 |
4 xALD W CH, OS_SErver Type, AP Frame |
国外
|
|
AMAT Vantage 5外延炉 |
AMAT |
Vantage 5 |
2012 |
RTP |
国外
|
|
AMAT Centura DPS2 Poly刻蚀机 |
AMAT |
Centura DPS2 Poly |
2007 |
EFEM(Kawasaki, Server), TM, 3x G5 Poly, 1x Axiom, AC Rack, Chiler |
国外
|
|
AMAT Centura DPS2 Poly刻蚀机 |
AMAT |
Centura DPS2 Poly |
2007 |
EFEM(Kawasaki, Server), TM, 3x G5 Poly, 1x Axiom, AC Rack, Chiler |
国外
|
|
AMAT Centura Enabler刻蚀机 |
AMAT |
Centura Enabler |
2006 |
EFEM(Server, Yaskawa), TM(VHP), 3x Enabler, AC Rack(w/CVCF, UPS), RF Rack(ENI B5002, GHW 50A), 1x Side Storage, Parts |
国外
|
|
AMAT P5000刻蚀机 |
AMAT |
P5000 |
1990 |
CVD Mark1, 3x DLH |
国外
|
|
AMAT Producer SE CVD化学气相沉积设备 |
AMAT |
Producer SE |
2006 |
2 Twiin( HF_Apex3013, LF_PDX9002V, RPC_FI20620-1), OS_Server Type, , Heating Jacket_Localized, MFCs_Localized |
国外
|
|
AMAT Centura Enabler Etch刻蚀机 |
AMAT |
Centura Enabler |
2010 |
EFEM(NT, Fixed Kawasaki), TM(VHP), 4x Enabler, AC Rack, RF Rack(ENI Spectrum 11002, GHW-50), 2x Sidestorage, Utility Box |
国外
|
|
AMAT mirra MESA CMP化学机械抛光设备 |
AMAT |
mirra MESA CMP |
- |
FULL REPUB |
国外
|
|
AMAT Producer GT CVD化学气相沉积设备 |
AMAT |
Producer GT |
2011 |
3 Twin(HARP USG, RPC_FI80131), FI(TDK_LP x4ea, OS_IBM306M)MFC: Unit125, NF3 15000 cc, Ar 15000 cc, N2 5000 cc, O2 30000 |
国外
|
|
AMAT Centura Enabler Etch刻蚀机 |
AMAT应用材料 |
Centura Enabler |
2007 |
- |
国外
|
|
AMAT Producer GT CVD化学气相沉积设备 |
AMAT |
Producer GT |
2010 |
1 Twin CH(ACL) only |
国外
|
|
AMAT AMC7821外延炉 |
AMAT |
AMC7821 |
2001 |
OEM rebuild aug-2001 Epitaxy |
国外
|
|
AMAT Centura DPS2 Metal等离子体蚀刻设备 |
AMAT |
Centura DPS2 Metal |
2005 |
EFEM(Server, Yaskawa), 3x G2 Metal, AC Rack, 1x Side Storage, 2x SMC Chiller, 3x Cathode Chiller, Utility Box, Tote |
国外
|
|
AMAT Reflexion FA抛光设备 |
AMAT |
Reflexion FA |
2005 |
CMP |
国外
|
|
AMAT P5000刻蚀机 |
AMAT |
P5000 |
1988 |
CVD Mark1, 3x DLH |
国外
|
|
AMAT Centura Axiom Chamber薄膜沉积设备 |
AMAT |
Centura Axiom Chamber |
2006 |
Axiom Only (w/VODM) |
国外
|
|
AMAT Centura DPS2 Metal等离子体蚀刻设备 |
AMAT |
Centura DPS2 Metal |
2005 |
EFEM(NT, Yaskawa), 3x G2 Metal, 1x Axiom(VODM), AC Rack, 1x Side Storage, 3x SMC Chiller, 2x Cathode Chiller, Utility Bo |
国外
|
|
AMAT NanoSEM 3D Metrology扫描电子显微镜 |
AMAT |
NanoSEM 3D |
2002 |
MULTIPLE UNITS AVAILABLE. PLEASE INQUIRE.
SEM - Critical Dimension (CD) Measurement
Currently configured for 300m |
国外
|
|
AMAT P5000刻蚀机 |
AMAT |
P5000 |
- |
8" REFURB |
国外
|
|
AMAT NanoSEM 3D Metrology扫描电子显微镜 |
AMAT |
NanoSEM 3D |
2002 |
ULTIPLE UNITS AVAILBLE. PLEASE INQUIRE.
SEM - Critical Dimension (CD) Measurement
Currently configured for 300m |
国外
|
|
AMAT Producer-GT CVD化学气相沉积 |
AMAT应用材料 |
Producer-GT CVD |
- |
As-is |
国外
|
|
AMAT Centura DPS+Poly Etch等离子体蚀刻设备 |
AMAT |
Centura DPS+Poly Etch |
- |
As-is |
国外
|
|
AMAT P-5000刻蚀机 |
AMAT应用材料 |
P-5000 |
1990 |
CVD |
国外
|
|
AMAT Centura XE+刻蚀机 |
AMAT应用材料 |
Centura XE+ |
2003 |
RTP |
国外
|
|
AMAT Centura XE刻蚀机 |
AMAT应用材料 |
Centura XE |
2003 |
RTP |
国外
|
|
AMAT Centura MXP刻蚀机 |
AMAT应用材料 |
Centura MXP |
1997 |
ETCH |
国外
|
|
AMAT Centura DXZ刻蚀机 |
AMAT应用材料 |
Centura DXZ |
1999 |
CVD |
国外
|
|
AMAT Centura DPS刻蚀机 |
AMAT应用材料 |
Centura DPS |
1998 |
ETCH |
国外
|
|
AMAT AKT-3500蚀刻机 |
AMAT应用材料 |
AKT-3500 |
2018 |
CVD |
国外
|
|
AMAT P5000刻蚀机 |
AMAT |
P5000 |
- |
FULL REPUB |
国外
|
 |
AMAT Endura II PVD气相沉积设备 |
AMAT |
Endura II |
2006 |
1x DSTTN |
已售出
|
|
AMAT Endura CL PVD气相沉积设备 |
AMAT |
Endura CL |
2004 |
EFEM(2Ports, Kensington), 1x Gen Rack, Compressor, 1x AC Rack, VHP missing, No cables |
国外
|
|
AMAT Endura CL PVD气相沉积设备 |
AMAT |
Endura CL |
2004 |
EFEM(2Ports, Kensington), , 2x AC Rack, 1x Gen Rack, 1x Transformer, 2x Compressor, NO Cables |
国外
|
|
AMAT Octane G2 assy气相沉积 |
AMAT应用材料 |
Octane G2 assy |
1999 |
- |
国外
|
|
AMAT Octane G2 assy气相沉积 |
AMAT应用材料 |
Octane G2 assy |
1999 |
- |
国外
|
|
AMAT Producer GT CVD化学气相沉积设备 |
AMAT |
Producer GT |
2017 |
Frontier FRONTIER etch for Junctions - CHA-SiCoNi, CHC-Frontier |
国外
|
|
AMAT Producer GT CVD化学气相沉积设备 |
AMAT |
Producer GT |
2015 |
Frontier FRONTIER etch for Junctions - CHA-SiCoNi, CHB-Frontier, CHC-Frontier |
国外
|
|
AMAT Producer GT CVD化学气相沉积设备 |
AMAT |
Producer GT |
2016 |
Frontier FRONTIER etch for Junctions - CHA-SiCoNi, CHB-Frontier, CHC-Frontier |
国外
|
|
AMAT Producer GT CVD化学气相沉积设备 |
AMAT |
Producer GT |
2015 |
3 Chamber: 1x SiCoNi PME, Frontier SMR Nitride, Frontier SMR Poly |
国外
|
|
AMAT NanoSEM 3D Metrology扫描电子显微镜 |
AMAT |
NanoSEM 3D |
2004 |
Installed. Operational. |
国外
|
|
AMAT Centura Chamber刻蚀机 |
AMAT应用材料 |
Centura Chamber |
2010 |
2 x Minos, 1 x Carina, 1 x Axion, Connected in a fab,), SW B2.870_gB7.50_37 |
国外
|
|
AMAT NanoSEM 3D Metrology扫描电子显微镜 |
AMAT |
NanoSEM 3D |
2004 |
Installed. Operational. LoadportX3 |
国外
|
|
AMAT UVision 5 Metrology光学检测计量设备 |
AMAT应用材料 |
UVision 5 |
2012 |
2port(TDK TAS300), Yaskawa robot & Aligner, Stage and Granite unlocked, Missing : Stage motor(X-Mirror), HDD
*Parts Sal |
国外
|
|
AMAT Centura Carina Chamber Etch刻蚀机 |
AMAT |
Centura Carina Chamber |
- |
Chamber Only.
Carina Etch Chamber.
Chamber Materials: ADVANCED CERAMIC
Lid Materials: AG 1000
Process Ring: QUARTZ |
国外
|
|
AMAT UVision 5 Metrology光学检测计量设备 |
AMAT |
UVision 5 |
2012 |
300mm G1 Load Port 2
Moving Monron V640 - Carrier ID Reader 2
EMULATOR V7.5 (Upgraded UV) 1
IBA and Virtual Recipe Co |
国外
|
|
AMAT UVision 5 Metrology光学检测计量设备 |
AMAT |
UVision 5 |
2011 |
- |
国外
|
|
AMAT ACMS0XT-ASG-E Component清洗设备 |
AMAT |
ACMS0XT-ASG-E |
2006 |
- |
国外
|
|
AMAT ACMS XT II Component晶圆清洗 |
AMAT |
ACMS XT II |
2005 |
- |
国外
|
|
AMAT Olympia CVD化学气相沉积设备 |
AMAT |
Olympia |
2015 |
2Ch ALD System, Single chamber, In a fab, warm idle |
国外
|
|
AMAT Producer GT CVD化学气相沉积设备 |
AMAT |
Producer GT |
2014 |
Parts Machine: 1 x Proudcer GT chamber
MISSING PARTS
UPS batteries or battery pack Qty / Units
missing door inte |
国外
|
|
AMAT Vantage Vulcan外延炉 |
AMAT |
Vantage Vulcan |
2013 |
2 Chamber RTP System |
国外
|
|
AMAT Centura Enabler Chamber蚀刻机 |
AMAT |
Centura Enabler Chamber |
2004 |
Condition : Very Good , CE Marked : YES , Dry Etch, Bx-, Cx-, E1 layers, 300mm wafers, 32nm BD/SICOH Etch ,MULTIPLE UNI |
国外
|
|
AMAT NanoSEM 3D Metrology扫描电子显微镜 |
AMAT |
NanoSEM 3D |
2004 |
Installed. Operational. |
国外
|
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