| 图 片 |
设备名称 |
制造商 |
型号 |
年份 |
详细配置 |
状 态 |
 |
VF电镀装置/15,000张 |
TKC |
- |
2009 |
COATING |
国外
|
|
VF电镀装置/15,000张 |
TKC |
- |
2011 |
COATING |
国外
|
|
4轴前处理机 |
Taesung |
- |
2009 |
COATING |
国外
|
|
2轴去毛刺设备 |
Taesung |
- |
2012 |
HARF MACHINE |
国外
|
|
水平去污设备 |
Keystone |
- |
- |
HARF MACHINE |
国外
|
|
Black Hole Machine |
Keystone |
- |
- |
SPS |
国外
|
|
Shield Press Machine |
DINGA |
- |
2012 |
RELIABILITY |
国外
|
|
Shield Press Machine |
VISION KOREA |
- |
2016 |
RELIABILITY |
国外
|
|
PCB BONDING Machine |
Hansong |
- |
2003 |
RELIABILITY |
国外
|
|
3次元测定器 |
MicroVu |
- |
2018 |
- |
国外
|
|
2010/2009 |
- |
- |
- |
- |
国外
|
|
3次元测定器 |
MicroVu |
- |
2005 |
- |
国外
|
|
电镀测厚仪 |
SEIKO |
- |
2012 |
- |
国外
|
|
Plasma Therm Versaline ICP-RIE #2 PSS IC |
Plasma |
Therm Versaline ICP-RIE #2 PSS |
- |
As-is |
国外
|
|
AMSL XT760F KrF Scanner |
AMSL |
XT760F KrF Scanner |
- |
As-is |
国外
|
|
EBARA EPO 222 CMP |
EBARA |
EPO-222 CMP |
- |
As-is |
国外
|
|
Oxford Plasmalab System 100 RIE+PECVD |
OXFORD牛津 |
Plasmalab System 100 RIE+PECVD |
- |
As-is |
国外
|
|
DNS SU3200 |
DNS |
SU3200 |
- |
As-is |
国外
|
|
LAM RAINBOW 4420等离子刻蚀机 |
LAM泛林 |
RAINBOW 4420 |
- |
6" As-is |
国外
|
|
KLA Tencor 2552缺陷数据分析处理仪 |
KLA科磊 |
2552 |
- |
As-is |
国外
|
|
USHIO UX-4440 Aligner |
USHIO |
UX-4440 Aligner |
- |
As-is |
国外
|
|
CHA Revolution |
CHA |
Revolution |
- |
As-is |
国外
|
|
ULVAC EX W300多腔溅射设备 |
ULVAC爱发科 |
EX W300 |
- |
As-is Multi-ch(8ch)Sputtering |
国外
|
|
ULVAC EI-7K蒸发台 |
ULVAC爱发科 |
EI-7K |
- |
As-is |
国外
|
|
ULVAC EI-5K蒸发台 |
ULVAC爱发科 |
EI-5K |
- |
As-is |
国外
|
|
ULVAC Chamber(5CH) |
ULVAC爱发科 |
Chamber(5CH) |
- |
12" As-is |
国外
|
|
EBARA F-REX300S CMP |
EBARA |
F-REX300S CMP |
- |
12" FULL REPUB |
国外
|
|
Maxis 300LA ICP |
Maxis |
300LA ICP |
- |
12" As-is |
国外
|
|
Nippon Sanso |
Nippon |
Sanso |
- |
6" As-is |
国外
|
|
Aixtron Crius II MOCVD设备 |
Aixtron |
Crius II |
- |
As-is |
国外
|
|
DISCO DFD641划片机 |
DISCO |
DFD641 |
- |
8"Working |
国外
|
|
Oxford Plasma Pro NGP1000 |
OXFORD牛津 |
Plasma Pro NGP1000 |
- |
12" As-is |
国外
|
|
AMAT Centura DPS+ Poly Etch |
AMAT应用材料 |
Centura DPS+ Poly Etch |
- |
As-is |
国外
|
|
AMAT Producer-GT CVD |
AMAT应用材料 |
Producer-GT CVD |
- |
As-is |
国外
|
|
AMAT mirra MESA CMP |
AMAT应用材料 |
mirra MESA CMP |
- |
FULL REPUB |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
- |
8" REFURB |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
- |
FULL REPUB |
国外
|
|
HITACHI HL7800M |
HITACHI |
HL7800M |
- |
As-is |
国外
|
|
HITACHI HL8000M |
HITACHI |
HL8000M |
- |
As-is |
国外
|
|
HITACHI S-4800扫描电子显微镜 |
HITACHI |
S4800 |
- |
working |
国外
|
|
HITACHI FESEM S4700 II扫描电子显微镜 |
HITACHI |
FESEM S4700 II |
- |
FULL REPUB |
国外
|
|
HITACHI FESEM S4700 II扫描电子显微镜 |
HITACHI |
FESEM S4700 II |
- |
Working |
国外
|
|
HITACHI S-9260A扫描电子显微镜 |
HITACHI |
S-9260A |
- |
8" FULL REPUB CDSEM |
国外
|
|
TEL P-12XL Probe |
TEL |
P-12XL Probe |
- |
12" As-is |
国外
|
|
TEL MARK-VZ涂胶显影机 |
TEL |
MARK-VZ |
- |
As-is 2C2D |
国外
|
|
TEL ACT8 2C4D, Double Block |
TEL |
ACT8 2C4D, Double Block |
- |
working |
国外
|
|
TEL MARK8涂胶显影机 |
TEL |
MARK8 |
- |
working track (2c1d) |
国外
|
|
TEL MARK7涂胶显影机 |
TEL |
MARK7 |
- |
200 As-is Single Block |
国外
|
|
TEL MARK8涂胶显影机 |
TEL |
MARK8 |
- |
200 As-is Single Block |
国外
|
|
TEL ACT12 Single Block |
TEL |
ACT12 Single Block |
- |
300 As-is |
国外
|
|
TEL ACT8 Single Block |
TEL |
ACT8 Single Block |
- |
200 As-is |
国外
|
|
CANON FPA-3000i4步进式光刻机 |
CANON |
FPA-3000i4 |
- |
Working |
国外
|
|
NIKON NSR S205C光刻机 |
NIKON |
NSR-S205C |
- |
As-is |
国外
|
|
NIKON NSR SF200光刻机 |
NIKON |
NSR-SF200 |
2003 |
Working |
国外
|
|
NIKON NSR 207D光刻机 |
NIKON |
NSR-207D |
- |
working |
国外
|
|
NIKON NSR 2205i12D光刻机 |
NIKON |
NSR-2205i12D |
- |
Initial Condition |
国外
|
|
NIKON NSR 2005i9C步进式光刻机 |
NIKON |
NSR-2005i9C |
- |
Working |
国外
|
|
NIKON NSR 2205 EX12B光刻机 |
NIKON |
NSR-2205EX12B |
- |
As-is |
国外
|
|
NIKON NSR 1505G7E光刻机 |
NIKON |
NSR-1505G7E |
- |
6" Working |
国外
|
|
NIKON NSR 2205i12D光刻机 |
NIKON |
NSR-2205i12D |
- |
6"reticle(SMIF), Inline with ACT1 |
国外
|
|
NIKON NSR 2005i9C步进式光刻机 |
NIKON |
NSR-2005i9C |
- |
- |
国外
|
|
NIKON NSR 2205 EX12B光刻机 |
NIKON |
NSR-2205EX12B |
- |
Available Dec, 2021, w/SMIF |
国外
|
|
NIKON NSR 1505G7E光刻机 |
NIKON |
NSR-1505G7E |
- |
w/cymer laser, w/SMIF |
国外
|
|
Advantest T5375 ATE |
Advantest |
T5375 |
- |
single head with PM option |
国外
|
|
KARL SUSS MA200光刻机 |
KARL SUSS |
MA200 |
1989 |
8" Holder , 2x Optic Lens(5x, 10x |
国外
|
|
AMAT Centura DPS2 Metal |
AMAT应用材料 |
Centura DPS2 Metal |
2005 |
EFEM(NT, Yaskawa), 3x G2 Metal, 1 |
国外
|
|
AMAT Centura Axiom Chamber |
AMAT应用材料 |
Centura Axiom Chamber |
2006 |
Axiom Only (w/VODM) |
国外
|
|
Mattson Helios RTP |
Mattson |
Helios |
2009 |
3x TDK TAS300 Load port, 2x Chabm |
国外
|
|
Mattson Helios RTP |
Mattson |
Helios |
2004 |
1. Chamber Qty. =2 2. transforme |
国外
|
|
Mattson Helios RTP |
Mattson |
Helios |
2004 |
3x TDK TAS300 Load port, 2x Chabm |
国外
|
|
Mattson Helios RTP |
Mattson |
Helios |
2005 |
3x TDK TAS300 Load port, 2x Chabm |
国外
|
|
Agilent 4073B ATE |
Agilent |
4073B |
2005 |
48Pin / SMU:HRSMU(x2), MPSMU(x6) |
国外
|
|
Agilent 4073A ATE |
Agilent |
4073A |
2001 |
32pin(of 32pins, 4pins fail), MP |
国外
|
|
Agilent 4073B ATE |
Agilent |
4073B |
2011 |
48pin, SMU7[MPSMU(4), HPSMU(1), H |
国外
|
|
AMAT P5000刻蚀机 |
AMAT应用材料 |
P5000 |
1988 |
CVD Mark1, 3x DLH |
国外
|
|
TEL LITHIUS Pro-i |
TEL |
LITHIUS Pro-i |
2007 |
9COT 3DEV with many CCHA bake and |
国外
|
|
TEL LITHIUS涂胶显影机 |
TEL |
LITHIUS |
2007 |
5C5D, Inlined type(AT-850F), FOUP |
国外
|
|
AMAT Reflexion FA |
AMAT应用材料 |
Reflexion FA |
2005 |
CMP |
国外
|
|
KARL SUSS CBC200 |
KARL SUSS |
CBC200 |
2013 |
Cluster Frame, Process Module x4, |
国外
|
|
TERADYNE MAGNUM2X 2x GVLC |
TERADYNE |
MAGNUM2X 2x GVLC |
- |
Frame Only. No board included / i |
国外
|
|
TERADYNE MAGNUM2X SSV |
TERADYNE |
MAGNUM2X SSV |
- |
[Missing indicated] : Base Board |
国外
|
|
KARL SUSS CB200M |
KARL SUSS |
CB200M |
2012 |
Process chamber, Transfer Unit. B |
国外
|
|
AMAT Vantage 5 |
AMAT应用材料 |
Vantage 5 |
2012 |
RTP |
国外
|
|
KLA Viper 2435 |
KLA科磊 |
Viper 2435 |
2006 |
- |
国外
|
|
KLA Viper 2438 |
KLA科磊 |
Viper 2438 |
2008 |
- |
国外
|
|
TERADYNE IP750测试系统 |
TERADYNE |
IP750 |
2000 |
512ch head(1), ws(COMPAQ Evo W800 |
国外
|
|
TERADYNE IP750测试系统 |
TERADYNE |
IP750 |
2000 |
512ch head(1), ws(PFU Limited PDS |
国外
|
|
TERADYNE IP750测试系统 |
TERADYNE |
IP750 |
2000 |
512ch head(1), ws(COMPAQ Evo W800 |
国外
|
|
TERADYNE IP750EP测试系统 |
TERADYNE |
IP750EP |
2002 |
512ch head(1), ws(PFU limited PDS |
国外
|
|
TERADYNE IP750测试系统 |
TERADYNE |
IP750 |
2000 |
Power conditioner(1ea, small type |
国外
|
|
TERADYNE UltraFLEX |
TERADYNE |
UltraFLEX |
2011 |
Z800(W/S)36 slot Testhead . HSD-I |
国外
|
|
TERADYNE J750EX测试系统 |
TERADYNE |
J750EX |
2015 |
1024ch size Large TH, DPS(2), CUB |
国外
|
|
TERADYNE IP750EX测试系统 |
TERADYNE |
IP750EX |
2001 |
HEAD(Modified from J750), Rack(Ma |
国外
|
|
TERADYNE J750测试系统 |
TERADYNE |
J750 |
2004 |
韩国 Main, Head, W/S(XW8400), Power |
国外
|
|
SMT |
Famecs |
FMBL-200AND-SHE |
2013 |
- |
国外
|
|
TERADYNE IP750测试系统 |
TERADYNE |
IP750 |
2000 |
512ch head(1), ws(PFU limited PDS |
国外
|
|
TERADYNE IP750S测试系统 |
TERADYNE |
IP750S |
- |
512ch head(1), ws(PFU limited PDS |
国外
|
|
PKG |
Musashi |
AWATRON2 AW-MV310 |
2013 |
Vacuum Pump : 2Torr, 100l/min. |
国外
|
|
NIKON N-SIS超分辨率显微镜 |
NIKON |
N-SIS 5 |
- |
- |
国外
|
|
NIKON N-SIS超分辨率显微镜 |
NIKON |
N-SIS 5 |
- |
- |
国外
|
|
NIKON N-SIS超分辨率显微镜 |
NIKON |
N-SIS 5 |
- |
- |
国外
|
|
NIKON N-SIS超分辨率显微镜 |
NIKON |
N-SIS 5 |
- |
- |
国外
|
|
NIKON N-SIS超分辨率显微镜 |
NIKON |
N-SIS 5 |
- |
- |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2004 |
4 x CVD TiN, 3 x load port FI ro |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2011 |
Trias E+, UV RF CH x3 |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2006 |
Ti Ch x2, TiN Ch x2, Stage Heater |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2012 |
3CH |
国外
|
|
TEL Trias CVD |
TEL |
Trias |
2013 |
EXII ALD TiN 1CH System |
国外
|
|
TEL Trias SPA CVD |
TEL |
Trias SPA |
2010 |
LM+TM+AC Rack, Missing: PM |
国外
|
|
ACCRETECH UF3000探针台 |
ACCRETECH东京精密 |
UF3000 |
2007 |
Right Single Loader, Hot Nickel C |
国外
|
|
AXCELIS RapidCure 320FC Track |
AXCELIS |
RapidCure 320FC |
2007 |
- |
国外
|
|
NITTO HR8500II撕膜机 |
NITTO |
HR8500II |
2002 |
5,6,8" Universal Chuck, Loader/Un |
国外
|
|
AMAT Centura DPS2 Metal |
AMAT应用材料 |
Centura DPS2 Metal |
2005 |
EFEM(Server, Yaskawa), 3x G2 Meta |
国外
|
|
AMAT Producer GT CVD |
AMAT应用材料 |
Producer GT |
2011 |
3 Twin(HARP USG, RPC_FI80131), FI |
国外
|
|
AMAT Producer GT Chamber CVD |
AMAT应用材料 |
Producer GT Chamber |
2010 |
1 Twin CH(ACL) only |
国外
|
|
KLA Spectra FX200薄膜量测 |
KLA科磊 |
FX200 |
2006 |
[Power-on] 2port(TDK), Yaskawa(Al |
国外
|
|
Micromanipulator 9000-VIT |
Micromanipulator |
9000-VIT |
2005 |
- |
国外
|
|
TEL TSP 305 SCCM TE Etch |
TEL |
TSP 305 SCCM TE |
2007 |
3x TE configured |
国外
|
|
Component |
Blue M |
DCC-206-EV-ST350 |
1999 |
- |
国外
|
|
EBARA EST 300 |
EBARA |
EST-300 |
- |
- |
国外
|
|
EBARA EST200WN |
EBARA |
EST-200WN |
- |
- |
国外
|
|
Metrology |
VLSI Standard |
PDS-100 |
2000 |
Particle Counters in Metrology Eq |
国外
|
|
Advantest 83000 ATE |
Advantest |
83000 |
2000 |
- |
国外
|
|
Advantest 83000 ATE |
Advantest |
83000 |
- |
- |
国外
|
|
Advantest 83000 ATE |
Advantest |
83000 |
- |
- |
国外
|
|
Metrology |
VEECO |
V220SI |
- |
- |
国外
|
|
Component |
ITS |
Single Mix Tank |
- |
- |
国外
|
|
Electroglas EG2001X ATE |
Electroglas |
EG2001X |
- |
- |
国外
|
|
Component |
Blue M |
RG-3010F-2 |
- |
System S/N: R2-606 |
国外
|
|
Steag ElectroDep 2000 Etch |
Steag |
ElectroDep 2000 |
2000 |
- |
国外
|
|
AG Associates Steag Etch |
AG Associates |
Steag |
- |
- |
国外
|
|
Component |
Oryx |
M65X |
- |
- |
国外
|
|
Component |
Oryx |
M65X |
- |
- |
国外
|
|
Electroglas EG4090u ATE |
Electroglas |
EG4090u |
1999 |
Tool was functional when powered |
国外
|
|
Electroglas EG4090u ATE |
Electroglas |
EG4090u |
1999 |
Tool was functional when powered |
国外
|
|
Electroglas EG4090u ATE |
Electroglas |
EG4090u |
1999 |
Tool was functional when powered |
国外
|
|
Electroglas EG4090u ATE |
Electroglas |
EG4090u |
2004 |
Tool was functional when powered |
国外
|
|
Metrology |
PMS |
Lasair 110 |
2013 |
- |
国外
|
|
WET |
GTX |
Wet Bench |
- |
- |
国外
|
|
Kinetic Systems 9101-21-21 |
Kinetic Systems |
9101-21-21 |
1994 |
- |
国外
|
|
Component |
Akrion |
UP V2 MP.2000 |
- |
Bagged & Skidded in warehouse |
国外
|
|
Component |
Thermo Fisher Scientific |
FED720 |
- |
- |
国外
|
|
Component |
Feedmatic |
Vacuum Sealer |
1997 |
- |
国外
|
|
Component |
Akrion |
UP V2 MP.2000 |
1999 |
Bagged & Skidded in warehouse |
国外
|
|
KLA CRS1010 |
KLA科磊 |
CRS1010 |
1998 |
Microscope |
国外
|
|
WET |
Autoclean |
ISG-2000 |
- |
- |
国外
|
|
Component |
Akrion |
UP V2 MP.2000 |
2000 |
- |
国外
|
|
Component |
Akrion |
UP V2 MP.2000 |
2000 |
Bagged & Skidded in warehouse |
国外
|
|
Component |
Akrion |
UP V2 MP.2000 |
- |
Main system 1, Fire suppression 2 |
国外
|
|
Component |
Sonicor Instrument |
TS-2404/402424H |
- |
- |
国外
|
|
Unknown Parts Clean Box-Exhaust |
Unknown |
Parts Clean Box-Exhausted |
1995 |
for Parts Cleaning |
国外
|
|
LAM Synergy CMP |
LAM泛林 |
Synergy |
1997 |
- |
国外
|
|
WET |
Akrion |
MP-2000 |
2000 |
Unhooked, dismatlted and packed |
国外
|
|
HITACHI AS5000 |
HITACHI |
AS5000 |
1997 |
Metrology / SEMs in?Microscopes, |
国外
|
|
Component |
Thermo Fisher Scientific |
FED720 |
- |
- |
国外
|
|
LASERTEC PEGSIS P100 |
LASERTEC |
PEGSIS P100 |
2011 |
- |
国外
|
|
Component |
Thermo Fisher Scientific |
FD400 |
1995 |
- |
国外
|
|
Component |
Jackson Automation |
EXHAUST BOX |
2000 |
Implant / Clean Room Equipment in |
国外
|
|
Component |
Jackson Automation |
Exhaust Cabinet |
- |
- |
国外
|
|
Component |
Blue M |
DCC206CY |
1995 |
- |
国外
|
|
Component |
Jackson Automation |
Exhaust Cabinet |
- |
- |
国外
|
|
Metrology |
JEOL |
JWS-7515 |
1999 |
- |
国外
|
|
WET |
Pan Abrasives |
KS9090WB/SS4 |
- |
- |
国外
|
|
AG Associates Extraction, Amine |
AG Associates |
Extraction, Amine |
2000 |
- |
国外
|
|
Component |
Thermo Fisher Scientific |
FD400 |
- |
- |
国外
|
|
Component |
Thermo Fisher Scientific |
FED720 |
- |
- |
国外
|
|
Nanometrics Q200I |
Nanometrics |
Q200I |
2000 |
2 X Indexer |
国外
|
|
Component |
NCB Network |
NF200 |
2007 |
- |
国外
|
|
KLA Polylite 88 |
KLA科磊 |
Polylite 88 |
- |
- |
国外
|
|
Component |
Blue M |
DCC206CY |
- |
- |
国外
|
|
Temptronic TPO4000A-2B21-2 ATE |
Temptronic |
TPO4000A-2B21-2 |
2008 |
location : Singapore |
国外
|
|
PKG |
Blue M |
DCC-1406CY |
1995 |
Convection Bake Oven |
国外
|
|
Semilab SPVCMS4000 |
Semilab |
SPVCMS4000 |
1995 |
- |
国外
|
|
Sonicar TS-12047HC |
Sonicar |
TS-12047HC |
- |
- |
国外
|
|
SMT |
UNIVERSAL PLASTICS |
Solvent Bench |
1995 |
Heating of Flow-Flashpoint Solven |
国外
|
|
Metrology |
JEOL |
JWS-7555 |
2002 |
- |
国外
|
|
Metrology |
JEOL |
JWS-7555 |
2000 |
- |
国外
|
|
Furnace |
BTU |
TCAS 181-7-72-E-36 |
2001 |
Controlled Atmosphere Furnace |
国外
|
|
KARL SUSS XBC300晶圆键合机 |
KARL SUSS |
XBC300 |
- |
300mm Wafer/ Glass Bonder |
国外
|
|
SCREEN SU-3100 WET |
SCREEN |
SU-3100 |
2011 |
8 chambers BEOL single wafer clea |
国外
|
|
TEL Alpha-303i Furnace |
TEL |
Alpha-303i |
- |
VMM-56-002, 2 boats, SiH4, PH3, C |
国外
|
|
AMAT Centura Enabler Etch |
AMAT应用材料 |
Centura Enabler |
2007 |
- |
国外
|
|
Component |
Adixen |
APR4300 |
2014 |
In crate, In warehouse |
国外
|
|
Component |
Adixen |
APR4300 |
2014 |
Unhooked. In warehouse |
国外
|
|
Advantest 83000 |
Advantest |
83000 |
2000 |
Tester, F330t , 256 pins |
国外
|
|
Advantest 83000 |
Advantest |
83000 |
2000 |
Tester, F330t , 128 pins |
国外
|
|
Agilent 81110A |
Agilent |
81110A |
- |
- |
国外
|
|
KOKUSAI DJ-1206VN-DM |
KOKUSAI |
DJ-1206VN-DM |
2006 |
- |
国外
|
|
TEL Alpha-303i Furnace |
TEL |
Alpha-303i |
- |
VMM-56-002, 2 boats |
国外
|
|
TEL Alpha-303i Furnace |
TEL |
Alpha-303i |
- |
VMM-56-002, 2 boats, SiH4, PH3, C |
国外
|
|
TEL Alpha-303i Furnace |
TEL |
Alpha-303i |
- |
VMM-56-002, 2 boats, SiH4, PH3, C |
国外
|
|
Component |
KINIK |
BI2 |
- |
- |
国外
|
|
SCREEN SU-3100 WET |
SCREEN |
SU-3100 |
2011 |
8 chambers single wafer clean |
国外
|
|
SCREEN SU-3100 WET |
SCREEN |
SU-3100 |
2013 |
8 chambers single wafer clean |
国外
|
|
Jordan Valley JVX6200i |
Jordan Valley |
JVX6200i |
2011 |
- |
国外
|
|
Metrology |
Toray |
HS-830 |
2010 |
- |
国外
|
|
TEL nFusion 700 Implant |
TEL |
nFusion 700 |
2013 |
- |
国外
|
|
Novellus Inova NExT PVD |
Novellus |
Inova NExT |
2007 |
3ports, 4x Ti, 2x AlCu, Degas |
国外
|
|
AXCELIS COMPACT II Furnace |
AXCELIS |
COMPACT II |
- |
- |
国外
|
|
Semitool Raider ECD310 |
Semitool |
Raider ECD310 |
2006 |
Capsule (Cleanning Chamber)x4, EC |
国外
|
|
